METHOD OF THIN LAYER DEPOSITION USING CONTROLLED ELECTRON AND ION

The present invention relates to a method for depositing a thin film using electron and ion control. A method for depositing a thin film according to one embodiment comprises a deposition cycle comprising: a step of supplying a precursor to a chamber, in which a structure is loaded, to expose the pr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JEON HYEONG TAG, SONG SEOK HWI, PARK SU HYEON, CHO HAE WON, JUNG CHAN WON, KWON YU RIM
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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