PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER
The present invention relates to a photosensitive resin composition comprising: (A) quantum dots; (B) a binder resin; (C) a polymerizable monomer; (D) a photopolymerization initiator; (E) a light diffusing agent; (F) a resin including a structural unit represented by chemical formula 1; and (G) a so...
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| creator | CHOI, JONG KYU JEONG, JI YOUNG CHUNG, MIN KYEOL LEE, BUM JIN |
| description | The present invention relates to a photosensitive resin composition comprising: (A) quantum dots; (B) a binder resin; (C) a polymerizable monomer; (D) a photopolymerization initiator; (E) a light diffusing agent; (F) a resin including a structural unit represented by chemical formula 1; and (G) a solvent, to a photosensitive resin film manufactured using the same, and to a color filter comprising the photosensitive resin film. In the chemical formula 1, each substituent is the same as defined in the specification.
(A) 양자점; (B) 바인더 수지; (C) 중합성 단량체; (D) 광중합 개시제; (E) 광확산제; (F) 하기 화학식 1로 표시되는 구조단위를 포함하는 수지; 및 (G) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.) |
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(A) 양자점; (B) 바인더 수지; (C) 중합성 단량체; (D) 광중합 개시제; (E) 광확산제; (F) 하기 화학식 1로 표시되는 구조단위를 포함하는 수지; 및 (G) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191217&DB=EPODOC&CC=KR&NR=20190139029A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191217&DB=EPODOC&CC=KR&NR=20190139029A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHOI, JONG KYU</creatorcontrib><creatorcontrib>JEONG, JI YOUNG</creatorcontrib><creatorcontrib>CHUNG, MIN KYEOL</creatorcontrib><creatorcontrib>LEE, BUM JIN</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER</title><description>The present invention relates to a photosensitive resin composition comprising: (A) quantum dots; (B) a binder resin; (C) a polymerizable monomer; (D) a photopolymerization initiator; (E) a light diffusing agent; (F) a resin including a structural unit represented by chemical formula 1; and (G) a solvent, to a photosensitive resin film manufactured using the same, and to a color filter comprising the photosensitive resin film. In the chemical formula 1, each substituent is the same as defined in the specification.
(A) 양자점; (B) 바인더 수지; (C) 중합성 단량체; (D) 광중합 개시제; (E) 광확산제; (F) 하기 화학식 1로 표시되는 구조단위를 포함하는 수지; 및 (G) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgO8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspYFXg4xjpGqQQCmS6K4R4uCoEO_q6Kjj6uQB1-vgHKbh5-oS4BvEwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDQ0sDQ2NLAyNLR2PiVAEAttQzhg</recordid><startdate>20191217</startdate><enddate>20191217</enddate><creator>CHOI, JONG KYU</creator><creator>JEONG, JI YOUNG</creator><creator>CHUNG, MIN KYEOL</creator><creator>LEE, BUM JIN</creator><scope>EVB</scope></search><sort><creationdate>20191217</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER</title><author>CHOI, JONG KYU ; JEONG, JI YOUNG ; CHUNG, MIN KYEOL ; LEE, BUM JIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20190139029A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHOI, JONG KYU</creatorcontrib><creatorcontrib>JEONG, JI YOUNG</creatorcontrib><creatorcontrib>CHUNG, MIN KYEOL</creatorcontrib><creatorcontrib>LEE, BUM JIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHOI, JONG KYU</au><au>JEONG, JI YOUNG</au><au>CHUNG, MIN KYEOL</au><au>LEE, BUM JIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER</title><date>2019-12-17</date><risdate>2019</risdate><abstract>The present invention relates to a photosensitive resin composition comprising: (A) quantum dots; (B) a binder resin; (C) a polymerizable monomer; (D) a photopolymerization initiator; (E) a light diffusing agent; (F) a resin including a structural unit represented by chemical formula 1; and (G) a solvent, to a photosensitive resin film manufactured using the same, and to a color filter comprising the photosensitive resin film. In the chemical formula 1, each substituent is the same as defined in the specification.
(A) 양자점; (B) 바인더 수지; (C) 중합성 단량체; (D) 광중합 개시제; (E) 광확산제; (F) 하기 화학식 1로 표시되는 구조단위를 포함하는 수지; 및 (G) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; kor |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER |
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