NOVEL OXIME ESTER COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME

The present invention relates to an aromatic compound substituted with an oxime ester group, a method for manufacturing the same, and a photoresist composition comprising the same, which is useful for efficiently absorbing UV to provide a highly sensitive photosensitive composition. The present inve...

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Bibliographische Detailangaben
Hauptverfasser:	HONG WON KI, HA MIN SU, JIN SANG JUN, KANG JI SOUNG, LEE GYU SUNG, BYUN UGUN, LEE HYUN WOO, MOON BONG SEOK, CHIN SUNG MIN, PARK NO GILL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to an aromatic compound substituted with an oxime ester group, a method for manufacturing the same, and a photoresist composition comprising the same, which is useful for efficiently absorbing UV to provide a highly sensitive photosensitive composition. The present invention has an effect of providing the photoresist composition having excellent sensitivity to a long wavelength UV light source. 본 발명은 옥심에스테르기가 치환된 방향족화합물, 이의 제조방법 및 이를 포함하는 포토레지스트 조성물에 관한 것으로서 UV를 효율적으로 흡수하여 고감도의 감광성 조성물을 제공하는데 유용하다.