PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER
The present invention relates to a photosensitive resin composition which comprises: (A) quantum dot; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photoinitiator containing a metallocene compound; and (E) a solvent, and is capable of increasing a light retention rate by minimizing the...
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| creator | CHOI, JONG KYU JEONG, JI YOUNG CHUNG, MIN KYEOL LEE, BUM JIN GWAK, SEON YEONG RYU, YOUN JE PARK, ON YOU |
| description | The present invention relates to a photosensitive resin composition which comprises: (A) quantum dot; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photoinitiator containing a metallocene compound; and (E) a solvent, and is capable of increasing a light retention rate by minimizing the reduction in light conversion rate, to a photosensitive resin film manufactured using the same, and to a color filter comprising the photosensitive resin film.
(A) 양자점; (B) 바인더 수지; (C) 광중합성 단량체; (D) 메탈로센계 화합물을 포함하는 광중합 개시제; 및 (E) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. |
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(A) 양자점; (B) 바인더 수지; (C) 광중합성 단량체; (D) 메탈로센계 화합물을 포함하는 광중합 개시제; 및 (E) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgP8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspYFXg4xjpGqQQCmS6KwQ7-roqOPq5AHX5-AcpuHn6hLgG8TCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSSeO8gIwNDSwMDCzNLUxNHY-JUAQD0sDKR</recordid><startdate>20190724</startdate><enddate>20190724</enddate><creator>CHOI, JONG KYU</creator><creator>JEONG, JI YOUNG</creator><creator>CHUNG, MIN KYEOL</creator><creator>LEE, BUM JIN</creator><creator>GWAK, SEON YEONG</creator><creator>RYU, YOUN JE</creator><creator>PARK, ON YOU</creator><scope>EVB</scope></search><sort><creationdate>20190724</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER</title><author>CHOI, JONG KYU ; JEONG, JI YOUNG ; CHUNG, MIN KYEOL ; LEE, BUM JIN ; GWAK, SEON YEONG ; RYU, YOUN JE ; PARK, ON YOU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20190086954A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHOI, JONG KYU</creatorcontrib><creatorcontrib>JEONG, JI YOUNG</creatorcontrib><creatorcontrib>CHUNG, MIN KYEOL</creatorcontrib><creatorcontrib>LEE, BUM JIN</creatorcontrib><creatorcontrib>GWAK, SEON YEONG</creatorcontrib><creatorcontrib>RYU, YOUN JE</creatorcontrib><creatorcontrib>PARK, ON YOU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHOI, JONG KYU</au><au>JEONG, JI YOUNG</au><au>CHUNG, MIN KYEOL</au><au>LEE, BUM JIN</au><au>GWAK, SEON YEONG</au><au>RYU, YOUN JE</au><au>PARK, ON YOU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER</title><date>2019-07-24</date><risdate>2019</risdate><abstract>The present invention relates to a photosensitive resin composition which comprises: (A) quantum dot; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photoinitiator containing a metallocene compound; and (E) a solvent, and is capable of increasing a light retention rate by minimizing the reduction in light conversion rate, to a photosensitive resin film manufactured using the same, and to a color filter comprising the photosensitive resin film.
(A) 양자점; (B) 바인더 수지; (C) 광중합성 단량체; (D) 메탈로센계 화합물을 포함하는 광중합 개시제; 및 (E) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER |
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