TOXIC GAS TREATING SYSTEM

The present invention relates to an integrated processing system for purifying and discharging harmful gas generated in a semiconductor manufacturing process, and more specifically, to an integrated processing system for harmful gas, which integrally has a scrubbing dust collection unit, an electros...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NOH HAK JAE, YUN GEUM SOO, KIM HYUN HO
Format: Patent
Sprache:eng ; kor
Schlagworte:
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