POLYIMIDE FILM
Provided is a novel polyimide film which may be suitably used on a metal circuit board or a substrate of a multilayer structure where wires are formed in different directions from each other. In the first embodiment, the polyimide film satisfies the following conditions: a coefficient of thermal exp...
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creator | HIRAMATSU NAOHIKO OGURA MIKIHIRO WAGATSUMA RYOUSAKU |
description | Provided is a novel polyimide film which may be suitably used on a metal circuit board or a substrate of a multilayer structure where wires are formed in different directions from each other. In the first embodiment, the polyimide film satisfies the following conditions: a coefficient of thermal expansion (αT_MD) in an MD direction and a coefficient of thermal expansion (αT_TD) in a TD direction are both 2-7 ppm/°C; ¦αT_MD-αT_TD¦is less than or equal to 2 ppm/°C; a coefficient of moisture expansion (αH_MD) in an MD direction and a coefficient of moisture expansion (αH_TD) in a TD direction are both 3-16 ppm/%RH; and ¦αH_MD-αH_TD¦is less than or equal to 5 ppm/%RH. In the second embodiment, the polyimide film satisfies the following conditions: a tensile modulus (E_MD) in an MD direction and a tensile modulus (E_TD) in a TD direction are both 5-9 GPa; ¦E_MD-E_TD¦is less than or equal to 2 GPa; a degree of in-plane anisotropy (MT ratio) is less than or equal to 13; and a coefficient of static friction and a coefficient of dynamic friction are both less than or equal to 0.8.
[과제] 상이한 방향으로 배선을 형성한 금속 배선 기판이나 다층 구조의 기판 등에 바람직하게 이용할 수 있는 신규한 폴리이미드 필름을 제공한다. [해결 수단] 제1 양태에서는, 폴리이미드 필름에 있어서, MD 방향의 열팽창계수(αT), TD 방향의 열팽창계수(αT)를 모두 2~7 ppm/℃로 하고, |αT-αT|를 2 ppm/℃ 이하로 하고, MD 방향의 습도팽창계수(αH), TD 방향의 습도팽창계수(αH)를 모두 3~16 ppm/%RH로 하고, |αH-αH|를 5 ppm/%RH 이하로 한다. 제2 양태에서는, 폴리이미드 필름에 있어서, MD 방향의 인장 탄성률(E), TD 방향의 인장 탄성률(E)을 모두 5~9 GPa로 하고, |E-E|를 2 GPa 이하로 하고, 면 내 이방성 지수(MT 비)를 13 이하로 하고, 정지마찰계수와 동마찰계수 모두를 0.8 이하로 한다. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20190043458A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20190043458A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20190043458A3</originalsourceid><addsrcrecordid>eNrjZOAL8PeJ9PT1dHFVcPP08eVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGhpYGBibGJqYWjsbEqQIAOcEdzQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POLYIMIDE FILM</title><source>esp@cenet</source><creator>HIRAMATSU NAOHIKO ; OGURA MIKIHIRO ; WAGATSUMA RYOUSAKU</creator><creatorcontrib>HIRAMATSU NAOHIKO ; OGURA MIKIHIRO ; WAGATSUMA RYOUSAKU</creatorcontrib><description>Provided is a novel polyimide film which may be suitably used on a metal circuit board or a substrate of a multilayer structure where wires are formed in different directions from each other. In the first embodiment, the polyimide film satisfies the following conditions: a coefficient of thermal expansion (αT_MD) in an MD direction and a coefficient of thermal expansion (αT_TD) in a TD direction are both 2-7 ppm/°C; ¦αT_MD-αT_TD¦is less than or equal to 2 ppm/°C; a coefficient of moisture expansion (αH_MD) in an MD direction and a coefficient of moisture expansion (αH_TD) in a TD direction are both 3-16 ppm/%RH; and ¦αH_MD-αH_TD¦is less than or equal to 5 ppm/%RH. In the second embodiment, the polyimide film satisfies the following conditions: a tensile modulus (E_MD) in an MD direction and a tensile modulus (E_TD) in a TD direction are both 5-9 GPa; ¦E_MD-E_TD¦is less than or equal to 2 GPa; a degree of in-plane anisotropy (MT ratio) is less than or equal to 13; and a coefficient of static friction and a coefficient of dynamic friction are both less than or equal to 0.8.
[과제] 상이한 방향으로 배선을 형성한 금속 배선 기판이나 다층 구조의 기판 등에 바람직하게 이용할 수 있는 신규한 폴리이미드 필름을 제공한다. [해결 수단] 제1 양태에서는, 폴리이미드 필름에 있어서, MD 방향의 열팽창계수(αT), TD 방향의 열팽창계수(αT)를 모두 2~7 ppm/℃로 하고, |αT-αT|를 2 ppm/℃ 이하로 하고, MD 방향의 습도팽창계수(αH), TD 방향의 습도팽창계수(αH)를 모두 3~16 ppm/%RH로 하고, |αH-αH|를 5 ppm/%RH 이하로 한다. 제2 양태에서는, 폴리이미드 필름에 있어서, MD 방향의 인장 탄성률(E), TD 방향의 인장 탄성률(E)을 모두 5~9 GPa로 하고, |E-E|를 2 GPa 이하로 하고, 면 내 이방성 지수(MT 비)를 13 이하로 하고, 정지마찰계수와 동마찰계수 모두를 0.8 이하로 한다.</description><language>eng ; kor</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GENERAL PROCESSES OF COMPOUNDING ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PERFORMING OPERATIONS ; PRINTED CIRCUITS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS ; WORKING-UP</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190426&DB=EPODOC&CC=KR&NR=20190043458A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25555,76308</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190426&DB=EPODOC&CC=KR&NR=20190043458A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HIRAMATSU NAOHIKO</creatorcontrib><creatorcontrib>OGURA MIKIHIRO</creatorcontrib><creatorcontrib>WAGATSUMA RYOUSAKU</creatorcontrib><title>POLYIMIDE FILM</title><description>Provided is a novel polyimide film which may be suitably used on a metal circuit board or a substrate of a multilayer structure where wires are formed in different directions from each other. In the first embodiment, the polyimide film satisfies the following conditions: a coefficient of thermal expansion (αT_MD) in an MD direction and a coefficient of thermal expansion (αT_TD) in a TD direction are both 2-7 ppm/°C; ¦αT_MD-αT_TD¦is less than or equal to 2 ppm/°C; a coefficient of moisture expansion (αH_MD) in an MD direction and a coefficient of moisture expansion (αH_TD) in a TD direction are both 3-16 ppm/%RH; and ¦αH_MD-αH_TD¦is less than or equal to 5 ppm/%RH. In the second embodiment, the polyimide film satisfies the following conditions: a tensile modulus (E_MD) in an MD direction and a tensile modulus (E_TD) in a TD direction are both 5-9 GPa; ¦E_MD-E_TD¦is less than or equal to 2 GPa; a degree of in-plane anisotropy (MT ratio) is less than or equal to 13; and a coefficient of static friction and a coefficient of dynamic friction are both less than or equal to 0.8.
[과제] 상이한 방향으로 배선을 형성한 금속 배선 기판이나 다층 구조의 기판 등에 바람직하게 이용할 수 있는 신규한 폴리이미드 필름을 제공한다. [해결 수단] 제1 양태에서는, 폴리이미드 필름에 있어서, MD 방향의 열팽창계수(αT), TD 방향의 열팽창계수(αT)를 모두 2~7 ppm/℃로 하고, |αT-αT|를 2 ppm/℃ 이하로 하고, MD 방향의 습도팽창계수(αH), TD 방향의 습도팽창계수(αH)를 모두 3~16 ppm/%RH로 하고, |αH-αH|를 5 ppm/%RH 이하로 한다. 제2 양태에서는, 폴리이미드 필름에 있어서, MD 방향의 인장 탄성률(E), TD 방향의 인장 탄성률(E)을 모두 5~9 GPa로 하고, |E-E|를 2 GPa 이하로 하고, 면 내 이방성 지수(MT 비)를 13 이하로 하고, 정지마찰계수와 동마찰계수 모두를 0.8 이하로 한다.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PERFORMING OPERATIONS</subject><subject>PRINTED CIRCUITS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TRANSPORTING</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOAL8PeJ9PT1dHFVcPP08eVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGhpYGBibGJqYWjsbEqQIAOcEdzQ</recordid><startdate>20190426</startdate><enddate>20190426</enddate><creator>HIRAMATSU NAOHIKO</creator><creator>OGURA MIKIHIRO</creator><creator>WAGATSUMA RYOUSAKU</creator><scope>EVB</scope></search><sort><creationdate>20190426</creationdate><title>POLYIMIDE FILM</title><author>HIRAMATSU NAOHIKO ; OGURA MIKIHIRO ; WAGATSUMA RYOUSAKU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20190043458A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PERFORMING OPERATIONS</topic><topic>PRINTED CIRCUITS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TRANSPORTING</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>HIRAMATSU NAOHIKO</creatorcontrib><creatorcontrib>OGURA MIKIHIRO</creatorcontrib><creatorcontrib>WAGATSUMA RYOUSAKU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HIRAMATSU NAOHIKO</au><au>OGURA MIKIHIRO</au><au>WAGATSUMA RYOUSAKU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLYIMIDE FILM</title><date>2019-04-26</date><risdate>2019</risdate><abstract>Provided is a novel polyimide film which may be suitably used on a metal circuit board or a substrate of a multilayer structure where wires are formed in different directions from each other. In the first embodiment, the polyimide film satisfies the following conditions: a coefficient of thermal expansion (αT_MD) in an MD direction and a coefficient of thermal expansion (αT_TD) in a TD direction are both 2-7 ppm/°C; ¦αT_MD-αT_TD¦is less than or equal to 2 ppm/°C; a coefficient of moisture expansion (αH_MD) in an MD direction and a coefficient of moisture expansion (αH_TD) in a TD direction are both 3-16 ppm/%RH; and ¦αH_MD-αH_TD¦is less than or equal to 5 ppm/%RH. In the second embodiment, the polyimide film satisfies the following conditions: a tensile modulus (E_MD) in an MD direction and a tensile modulus (E_TD) in a TD direction are both 5-9 GPa; ¦E_MD-E_TD¦is less than or equal to 2 GPa; a degree of in-plane anisotropy (MT ratio) is less than or equal to 13; and a coefficient of static friction and a coefficient of dynamic friction are both less than or equal to 0.8.
[과제] 상이한 방향으로 배선을 형성한 금속 배선 기판이나 다층 구조의 기판 등에 바람직하게 이용할 수 있는 신규한 폴리이미드 필름을 제공한다. [해결 수단] 제1 양태에서는, 폴리이미드 필름에 있어서, MD 방향의 열팽창계수(αT), TD 방향의 열팽창계수(αT)를 모두 2~7 ppm/℃로 하고, |αT-αT|를 2 ppm/℃ 이하로 하고, MD 방향의 습도팽창계수(αH), TD 방향의 습도팽창계수(αH)를 모두 3~16 ppm/%RH로 하고, |αH-αH|를 5 ppm/%RH 이하로 한다. 제2 양태에서는, 폴리이미드 필름에 있어서, MD 방향의 인장 탄성률(E), TD 방향의 인장 탄성률(E)을 모두 5~9 GPa로 하고, |E-E|를 2 GPa 이하로 하고, 면 내 이방성 지수(MT 비)를 13 이하로 하고, 정지마찰계수와 동마찰계수 모두를 0.8 이하로 한다.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL PROCESSES OF COMPOUNDING LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PRINTED CIRCUITS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS WORKING-UP |
title | POLYIMIDE FILM |
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