LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE
The present invention relates to a lithographic device which forms a pattern on a substrate and is capable of efficiently removing particles generated by cleaning a substrate chuck, and a production method of a product. The lithographic device comprises: a holding and supporting unit for holding and...
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| creator | YONEKAWA MASAMI |
| description | The present invention relates to a lithographic device which forms a pattern on a substrate and is capable of efficiently removing particles generated by cleaning a substrate chuck, and a production method of a product. The lithographic device comprises: a holding and supporting unit for holding and supporting a substrate; and a cleaning member for cleaning the holding and supporting unit by bringing a polishing unit into contact with the holding and supporting unit, wherein the cleaning member includes: a supply port disposed in the polishing unit and for supplying gas; and a suction port disposed around the polishing unit and sucking the gas.
기판에 패턴을 형성하는 리소그래피 장치이며, 리소그래피 장치는, 기판을 보유지지하는 보유지지 유닛; 및 연마 유닛을 상기 보유지지 유닛에 접촉시켜서 상기 보유지지 유닛을 클리닝하는 클리닝 부재를 포함하고, 상기 클리닝 부재는, 상기 연마 유닛에 배치되고 기체를 공급하기 위한 공급구와, 상기 연마 유닛의 주변에 배치되고 기체를 흡인하기 위한 흡인구를 포함한다. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20190022364A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20190022364A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20190022364A3</originalsourceid><addsrcrecordid>eNrjZLD08Qzx8HcPcgzwiFRwDAhwDHIMCQ1WcPRzUfB1Bcq4KPi7Kfg6-oW6OTqHhAZ5-rkrOAaFeDr7uPIwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDQ0sDAyMjYzMTR2PiVAEAPwEpsw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE</title><source>esp@cenet</source><creator>YONEKAWA MASAMI</creator><creatorcontrib>YONEKAWA MASAMI</creatorcontrib><description>The present invention relates to a lithographic device which forms a pattern on a substrate and is capable of efficiently removing particles generated by cleaning a substrate chuck, and a production method of a product. The lithographic device comprises: a holding and supporting unit for holding and supporting a substrate; and a cleaning member for cleaning the holding and supporting unit by bringing a polishing unit into contact with the holding and supporting unit, wherein the cleaning member includes: a supply port disposed in the polishing unit and for supplying gas; and a suction port disposed around the polishing unit and sucking the gas.
기판에 패턴을 형성하는 리소그래피 장치이며, 리소그래피 장치는, 기판을 보유지지하는 보유지지 유닛; 및 연마 유닛을 상기 보유지지 유닛에 접촉시켜서 상기 보유지지 유닛을 클리닝하는 클리닝 부재를 포함하고, 상기 클리닝 부재는, 상기 연마 유닛에 배치되고 기체를 공급하기 위한 공급구와, 상기 연마 유닛의 주변에 배치되고 기체를 흡인하기 위한 흡인구를 포함한다.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190306&DB=EPODOC&CC=KR&NR=20190022364A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190306&DB=EPODOC&CC=KR&NR=20190022364A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YONEKAWA MASAMI</creatorcontrib><title>LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE</title><description>The present invention relates to a lithographic device which forms a pattern on a substrate and is capable of efficiently removing particles generated by cleaning a substrate chuck, and a production method of a product. The lithographic device comprises: a holding and supporting unit for holding and supporting a substrate; and a cleaning member for cleaning the holding and supporting unit by bringing a polishing unit into contact with the holding and supporting unit, wherein the cleaning member includes: a supply port disposed in the polishing unit and for supplying gas; and a suction port disposed around the polishing unit and sucking the gas.
기판에 패턴을 형성하는 리소그래피 장치이며, 리소그래피 장치는, 기판을 보유지지하는 보유지지 유닛; 및 연마 유닛을 상기 보유지지 유닛에 접촉시켜서 상기 보유지지 유닛을 클리닝하는 클리닝 부재를 포함하고, 상기 클리닝 부재는, 상기 연마 유닛에 배치되고 기체를 공급하기 위한 공급구와, 상기 연마 유닛의 주변에 배치되고 기체를 흡인하기 위한 흡인구를 포함한다.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD08Qzx8HcPcgzwiFRwDAhwDHIMCQ1WcPRzUfB1Bcq4KPi7Kfg6-oW6OTqHhAZ5-rkrOAaFeDr7uPIwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDQ0sDAyMjYzMTR2PiVAEAPwEpsw</recordid><startdate>20190306</startdate><enddate>20190306</enddate><creator>YONEKAWA MASAMI</creator><scope>EVB</scope></search><sort><creationdate>20190306</creationdate><title>LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE</title><author>YONEKAWA MASAMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20190022364A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>YONEKAWA MASAMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YONEKAWA MASAMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE</title><date>2019-03-06</date><risdate>2019</risdate><abstract>The present invention relates to a lithographic device which forms a pattern on a substrate and is capable of efficiently removing particles generated by cleaning a substrate chuck, and a production method of a product. The lithographic device comprises: a holding and supporting unit for holding and supporting a substrate; and a cleaning member for cleaning the holding and supporting unit by bringing a polishing unit into contact with the holding and supporting unit, wherein the cleaning member includes: a supply port disposed in the polishing unit and for supplying gas; and a suction port disposed around the polishing unit and sucking the gas.
기판에 패턴을 형성하는 리소그래피 장치이며, 리소그래피 장치는, 기판을 보유지지하는 보유지지 유닛; 및 연마 유닛을 상기 보유지지 유닛에 접촉시켜서 상기 보유지지 유닛을 클리닝하는 클리닝 부재를 포함하고, 상기 클리닝 부재는, 상기 연마 유닛에 배치되고 기체를 공급하기 위한 공급구와, 상기 연마 유닛의 주변에 배치되고 기체를 흡인하기 위한 흡인구를 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE |
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