Deposition apparatus

The present invention minimizes an occurrence of a clogging phenomenon in a nozzle. The deposition device according to an embodiment of the present invention comprises: a crucible in which a space for accommodating a deposition raw material is formed; a heater unit disposed outside the crucible for...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HA, JUNG MIN, LEE, JONG HWA, MOON, BYOUNG JUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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