PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER
Provided are a photosensitive resin composition, which comprises: (A) quantum dot; (B) a binder resin comprising a structural unit represented by chemical formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, a photosensitive resin layer produced by usi...
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creator | SON, BYEONG GEUN JEONG, JI YOUNG HYUNG, KYUNG HEE LEE, BUM JIN PARK, ON YOU KANG, YONG HEE KIM, JONG GI KIM, MI SUN CHUNG, MIN KYEOL YOUN, JIN SUOP RYU, YOUN JE YIM, JI HYEON JANG, YOUNG WOONG PAEK, HO JEONG HAN, HYUN JOO |
description | Provided are a photosensitive resin composition, which comprises: (A) quantum dot; (B) a binder resin comprising a structural unit represented by chemical formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, a photosensitive resin layer produced by using the composition, and a color filter containing the photosensitive resin layer. In the chemical formula 1, each substituent is the same as defined in the specification. One embodiment is to provide a quantum dot-containing photosensitive resin composition, which maintains high absolute quantum efficiency even after a color filter manufacturing process.
(A) 양자점; (B) 하기 화학식 1로 표시되는 구조단위를 포함하는 바인더 수지; (C) 광중합성 단량체; (D) 광중합 개시제; 및 (E) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.) |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20180067243A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20180067243A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20180067243A3</originalsourceid><addsrcrecordid>eNrjZAgP8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspYFXg4xjpGqQQCmS6KwQ7-roqOPq5AHX5-AcpuHn6hLgG8TCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSSeO8gIwNDCwMDM3MjE2NHY-JUAQDyljJ7</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER</title><source>esp@cenet</source><creator>SON, BYEONG GEUN ; JEONG, JI YOUNG ; HYUNG, KYUNG HEE ; LEE, BUM JIN ; PARK, ON YOU ; KANG, YONG HEE ; KIM, JONG GI ; KIM, MI SUN ; CHUNG, MIN KYEOL ; YOUN, JIN SUOP ; RYU, YOUN JE ; YIM, JI HYEON ; JANG, YOUNG WOONG ; PAEK, HO JEONG ; HAN, HYUN JOO</creator><creatorcontrib>SON, BYEONG GEUN ; JEONG, JI YOUNG ; HYUNG, KYUNG HEE ; LEE, BUM JIN ; PARK, ON YOU ; KANG, YONG HEE ; KIM, JONG GI ; KIM, MI SUN ; CHUNG, MIN KYEOL ; YOUN, JIN SUOP ; RYU, YOUN JE ; YIM, JI HYEON ; JANG, YOUNG WOONG ; PAEK, HO JEONG ; HAN, HYUN JOO</creatorcontrib><description>Provided are a photosensitive resin composition, which comprises: (A) quantum dot; (B) a binder resin comprising a structural unit represented by chemical formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, a photosensitive resin layer produced by using the composition, and a color filter containing the photosensitive resin layer. In the chemical formula 1, each substituent is the same as defined in the specification. One embodiment is to provide a quantum dot-containing photosensitive resin composition, which maintains high absolute quantum efficiency even after a color filter manufacturing process.
(A) 양자점; (B) 하기 화학식 1로 표시되는 구조단위를 포함하는 바인더 수지; (C) 광중합성 단량체; (D) 광중합 개시제; 및 (E) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180620&DB=EPODOC&CC=KR&NR=20180067243A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180620&DB=EPODOC&CC=KR&NR=20180067243A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SON, BYEONG GEUN</creatorcontrib><creatorcontrib>JEONG, JI YOUNG</creatorcontrib><creatorcontrib>HYUNG, KYUNG HEE</creatorcontrib><creatorcontrib>LEE, BUM JIN</creatorcontrib><creatorcontrib>PARK, ON YOU</creatorcontrib><creatorcontrib>KANG, YONG HEE</creatorcontrib><creatorcontrib>KIM, JONG GI</creatorcontrib><creatorcontrib>KIM, MI SUN</creatorcontrib><creatorcontrib>CHUNG, MIN KYEOL</creatorcontrib><creatorcontrib>YOUN, JIN SUOP</creatorcontrib><creatorcontrib>RYU, YOUN JE</creatorcontrib><creatorcontrib>YIM, JI HYEON</creatorcontrib><creatorcontrib>JANG, YOUNG WOONG</creatorcontrib><creatorcontrib>PAEK, HO JEONG</creatorcontrib><creatorcontrib>HAN, HYUN JOO</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER</title><description>Provided are a photosensitive resin composition, which comprises: (A) quantum dot; (B) a binder resin comprising a structural unit represented by chemical formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, a photosensitive resin layer produced by using the composition, and a color filter containing the photosensitive resin layer. In the chemical formula 1, each substituent is the same as defined in the specification. One embodiment is to provide a quantum dot-containing photosensitive resin composition, which maintains high absolute quantum efficiency even after a color filter manufacturing process.
(A) 양자점; (B) 하기 화학식 1로 표시되는 구조단위를 포함하는 바인더 수지; (C) 광중합성 단량체; (D) 광중합 개시제; 및 (E) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgP8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspYFXg4xjpGqQQCmS6KwQ7-roqOPq5AHX5-AcpuHn6hLgG8TCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSSeO8gIwNDCwMDM3MjE2NHY-JUAQDyljJ7</recordid><startdate>20180620</startdate><enddate>20180620</enddate><creator>SON, BYEONG GEUN</creator><creator>JEONG, JI YOUNG</creator><creator>HYUNG, KYUNG HEE</creator><creator>LEE, BUM JIN</creator><creator>PARK, ON YOU</creator><creator>KANG, YONG HEE</creator><creator>KIM, JONG GI</creator><creator>KIM, MI SUN</creator><creator>CHUNG, MIN KYEOL</creator><creator>YOUN, JIN SUOP</creator><creator>RYU, YOUN JE</creator><creator>YIM, JI HYEON</creator><creator>JANG, YOUNG WOONG</creator><creator>PAEK, HO JEONG</creator><creator>HAN, HYUN JOO</creator><scope>EVB</scope></search><sort><creationdate>20180620</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER</title><author>SON, BYEONG GEUN ; JEONG, JI YOUNG ; HYUNG, KYUNG HEE ; LEE, BUM JIN ; PARK, ON YOU ; KANG, YONG HEE ; KIM, JONG GI ; KIM, MI SUN ; CHUNG, MIN KYEOL ; YOUN, JIN SUOP ; RYU, YOUN JE ; YIM, JI HYEON ; JANG, YOUNG WOONG ; PAEK, HO JEONG ; HAN, HYUN JOO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20180067243A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2018</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>SON, BYEONG GEUN</creatorcontrib><creatorcontrib>JEONG, JI YOUNG</creatorcontrib><creatorcontrib>HYUNG, KYUNG HEE</creatorcontrib><creatorcontrib>LEE, BUM JIN</creatorcontrib><creatorcontrib>PARK, ON YOU</creatorcontrib><creatorcontrib>KANG, YONG HEE</creatorcontrib><creatorcontrib>KIM, JONG GI</creatorcontrib><creatorcontrib>KIM, MI SUN</creatorcontrib><creatorcontrib>CHUNG, MIN KYEOL</creatorcontrib><creatorcontrib>YOUN, JIN SUOP</creatorcontrib><creatorcontrib>RYU, YOUN JE</creatorcontrib><creatorcontrib>YIM, JI HYEON</creatorcontrib><creatorcontrib>JANG, YOUNG WOONG</creatorcontrib><creatorcontrib>PAEK, HO JEONG</creatorcontrib><creatorcontrib>HAN, HYUN JOO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SON, BYEONG GEUN</au><au>JEONG, JI YOUNG</au><au>HYUNG, KYUNG HEE</au><au>LEE, BUM JIN</au><au>PARK, ON YOU</au><au>KANG, YONG HEE</au><au>KIM, JONG GI</au><au>KIM, MI SUN</au><au>CHUNG, MIN KYEOL</au><au>YOUN, JIN SUOP</au><au>RYU, YOUN JE</au><au>YIM, JI HYEON</au><au>JANG, YOUNG WOONG</au><au>PAEK, HO JEONG</au><au>HAN, HYUN JOO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER</title><date>2018-06-20</date><risdate>2018</risdate><abstract>Provided are a photosensitive resin composition, which comprises: (A) quantum dot; (B) a binder resin comprising a structural unit represented by chemical formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, a photosensitive resin layer produced by using the composition, and a color filter containing the photosensitive resin layer. In the chemical formula 1, each substituent is the same as defined in the specification. One embodiment is to provide a quantum dot-containing photosensitive resin composition, which maintains high absolute quantum efficiency even after a color filter manufacturing process.
(A) 양자점; (B) 하기 화학식 1로 표시되는 구조단위를 포함하는 바인더 수지; (C) 광중합성 단량체; (D) 광중합 개시제; 및 (E) 용매를 포함하는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING SAME AND COLOR FILTER |
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