Ink composition for etching metallic thin film and Method for preparing the same
The present invention relates to an ink composition for etching a metallic thin film and a method for preparing the same and, more specifically, relates to an ink composition for etching a metallic thin film and a method for preparing the same, wherein a transition metal precursor and a glycol co-po...
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| creator | CHOE, DONG GWON SIM, SANG BO |
| description | The present invention relates to an ink composition for etching a metallic thin film and a method for preparing the same and, more specifically, relates to an ink composition for etching a metallic thin film and a method for preparing the same, wherein a transition metal precursor and a glycol co-polymer react to each other to generate a transition metal-glycol co-polymer complex compound, and a solvent, an oxidizing agent, and a dispersing agent are added to the generated transition metal-glycol co-polymer complex compound to prepare ink for etching a metallic thin film. According to the present invention, through the ink composition for etching a metallic thin film and the method for preparing the same, the ink composition has an excellent effect for etching characteristics with respect to a metallic thin film such as silver, copper, nickel, cobalt, molybdenum, or the like.
본 발명은 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 관한 것으로, 보다 구체적으로, 전이금속 전구체와 글리콜 코폴리머를 반응시켜 전이금속-글리콜 코폴리머 착화합물을 생성하고 상기 생성된 전이금속-글리콜 코폴리머 착화합물에 용제, 산화제 및 분산제를 첨가하여 메탈 박막 에칭용 잉크를 제조하는 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 관한 것이다. 본 발명의 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 따르면, 본 발명의 잉크 조성물은 은, 구리, 니켈, 코발트, 몰리브덴 등과 같은 메탈 박막에 대한 에칭 특성에 우수한 효과가 있다. |
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본 발명은 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 관한 것으로, 보다 구체적으로, 전이금속 전구체와 글리콜 코폴리머를 반응시켜 전이금속-글리콜 코폴리머 착화합물을 생성하고 상기 생성된 전이금속-글리콜 코폴리머 착화합물에 용제, 산화제 및 분산제를 첨가하여 메탈 박막 에칭용 잉크를 제조하는 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 관한 것이다. 본 발명의 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 따르면, 본 발명의 잉크 조성물은 은, 구리, 니켈, 코발트, 몰리브덴 등과 같은 메탈 박막에 대한 에칭 특성에 우수한 효과가 있다.</description><language>eng ; kor</language><subject>ADHESIVES ; CHEMICAL PAINT OR INK REMOVERS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CORRECTING FLUIDS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; DYES ; FILLING PASTES ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INKS ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NATURAL RESINS ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; POLISHES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180531&DB=EPODOC&CC=KR&NR=20180057957A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180531&DB=EPODOC&CC=KR&NR=20180057957A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHOE, DONG GWON</creatorcontrib><creatorcontrib>SIM, SANG BO</creatorcontrib><title>Ink composition for etching metallic thin film and Method for preparing the same</title><description>The present invention relates to an ink composition for etching a metallic thin film and a method for preparing the same and, more specifically, relates to an ink composition for etching a metallic thin film and a method for preparing the same, wherein a transition metal precursor and a glycol co-polymer react to each other to generate a transition metal-glycol co-polymer complex compound, and a solvent, an oxidizing agent, and a dispersing agent are added to the generated transition metal-glycol co-polymer complex compound to prepare ink for etching a metallic thin film. According to the present invention, through the ink composition for etching a metallic thin film and the method for preparing the same, the ink composition has an excellent effect for etching characteristics with respect to a metallic thin film such as silver, copper, nickel, cobalt, molybdenum, or the like.
본 발명은 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 관한 것으로, 보다 구체적으로, 전이금속 전구체와 글리콜 코폴리머를 반응시켜 전이금속-글리콜 코폴리머 착화합물을 생성하고 상기 생성된 전이금속-글리콜 코폴리머 착화합물에 용제, 산화제 및 분산제를 첨가하여 메탈 박막 에칭용 잉크를 제조하는 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 관한 것이다. 본 발명의 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 따르면, 본 발명의 잉크 조성물은 은, 구리, 니켈, 코발트, 몰리브덴 등과 같은 메탈 박막에 대한 에칭 특성에 우수한 효과가 있다.</description><subject>ADHESIVES</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CORRECTING FLUIDS</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INKS</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NATURAL RESINS</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>POLISHES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyj0KAjEQQOE0FqLeYcBaiMqyaymiKCKI2C9DdmKCSSYkc3_8wQNYPR58Y3U9pScYjpmrF88JLBcgMc6nB0QSDMEbkPeC9SECpgEuJI6Hr8yFMpaPFUdQMdJUjSyGSrNfJ2p-2N93xwVl7qlmNJRI-vNtpZed1k27adrt-j_1AkmSN9o</recordid><startdate>20180531</startdate><enddate>20180531</enddate><creator>CHOE, DONG GWON</creator><creator>SIM, SANG BO</creator><scope>EVB</scope></search><sort><creationdate>20180531</creationdate><title>Ink composition for etching metallic thin film and Method for preparing the same</title><author>CHOE, DONG GWON ; SIM, SANG BO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20180057957A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2018</creationdate><topic>ADHESIVES</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CORRECTING FLUIDS</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>DYES</topic><topic>FILLING PASTES</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INKS</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NATURAL RESINS</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>POLISHES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHOE, DONG GWON</creatorcontrib><creatorcontrib>SIM, SANG BO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHOE, DONG GWON</au><au>SIM, SANG BO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Ink composition for etching metallic thin film and Method for preparing the same</title><date>2018-05-31</date><risdate>2018</risdate><abstract>The present invention relates to an ink composition for etching a metallic thin film and a method for preparing the same and, more specifically, relates to an ink composition for etching a metallic thin film and a method for preparing the same, wherein a transition metal precursor and a glycol co-polymer react to each other to generate a transition metal-glycol co-polymer complex compound, and a solvent, an oxidizing agent, and a dispersing agent are added to the generated transition metal-glycol co-polymer complex compound to prepare ink for etching a metallic thin film. According to the present invention, through the ink composition for etching a metallic thin film and the method for preparing the same, the ink composition has an excellent effect for etching characteristics with respect to a metallic thin film such as silver, copper, nickel, cobalt, molybdenum, or the like.
본 발명은 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 관한 것으로, 보다 구체적으로, 전이금속 전구체와 글리콜 코폴리머를 반응시켜 전이금속-글리콜 코폴리머 착화합물을 생성하고 상기 생성된 전이금속-글리콜 코폴리머 착화합물에 용제, 산화제 및 분산제를 첨가하여 메탈 박막 에칭용 잉크를 제조하는 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 관한 것이다. 본 발명의 메탈 박막 에칭용 잉크 조성물 및 그 제조방법에 따르면, 본 발명의 잉크 조성물은 은, 구리, 니켈, 코발트, 몰리브덴 등과 같은 메탈 박막에 대한 에칭 특성에 우수한 효과가 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CORRECTING FLUIDS DIFFUSION TREATMENT OF METALLIC MATERIAL DYES FILLING PASTES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INKS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NATURAL RESINS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES USE OF MATERIALS THEREFOR WOODSTAINS |
| title | Ink composition for etching metallic thin film and Method for preparing the same |
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