BRUSH CLEANING APPARATUS

The present invention relates to a brush cleaning apparatus for cleaning a surface of a substrate. The apparatus comprises: a first cleaning brush coming in contact with the upper surface of a substrate by rotating; a second cleaning brush disposed at a lower portion of the first cleaning brush and...

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Hauptverfasser:	RYU, SEUNG HYEOK, SHIN, HYUNG HWAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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creator	RYU, SEUNG HYEOK SHIN, HYUNG HWAN
description	The present invention relates to a brush cleaning apparatus for cleaning a surface of a substrate. The apparatus comprises: a first cleaning brush coming in contact with the upper surface of a substrate by rotating; a second cleaning brush disposed at a lower portion of the first cleaning brush and coming in contact with the bottom surface of the surface by rotating; and a blocking part selectively blocking foreign matters falling from the first cleaning brush between the first cleaning brush and the second cleaning brush. Therefore, the apparatus can have an advantageous effect of preventing secondary contamination of the cleaning brush and ensuring uniform cleaning efficiency. 본 발명은 브러쉬 세정 장치에 관한 것으로, 기판의 표면을 세정하는 브러쉬 세정 장치는, 기판의 상면에 회전 접촉하는 제1세정브러쉬와, 제1세정브러쉬의 하부에 배치되며 기판의 저면에 회전 접촉하는 제2세정브러쉬와, 제1세정브러쉬와 제2세정브러쉬의 사이에서 선택적으로 제1세정브러쉬로부터 낙하하는 이물질을 차단하는 차단부를 포함하는 것에 의하여, 세정브러쉬의 2차 오염을 방지하고 세정 효율을 균일하게 보장하는 유리한 효과를 얻을 수 있다.
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The apparatus comprises: a first cleaning brush coming in contact with the upper surface of a substrate by rotating; a second cleaning brush disposed at a lower portion of the first cleaning brush and coming in contact with the bottom surface of the surface by rotating; and a blocking part selectively blocking foreign matters falling from the first cleaning brush between the first cleaning brush and the second cleaning brush. Therefore, the apparatus can have an advantageous effect of preventing secondary contamination of the cleaning brush and ensuring uniform cleaning efficiency. 본 발명은 브러쉬 세정 장치에 관한 것으로, 기판의 표면을 세정하는 브러쉬 세정 장치는, 기판의 상면에 회전 접촉하는 제1세정브러쉬와, 제1세정브러쉬의 하부에 배치되며 기판의 저면에 회전 접촉하는 제2세정브러쉬와, 제1세정브러쉬와 제2세정브러쉬의 사이에서 선택적으로 제1세정브러쉬로부터 낙하하는 이물질을 차단하는 차단부를 포함하는 것에 의하여, 세정브러쉬의 2차 오염을 방지하고 세정 효율을 균일하게 보장하는 유리한 효과를 얻을 수 있다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180504&DB=EPODOC&CC=KR&NR=20180045733A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180504&DB=EPODOC&CC=KR&NR=20180045733A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RYU, SEUNG HYEOK</creatorcontrib><creatorcontrib>SHIN, HYUNG HWAN</creatorcontrib><title>BRUSH CLEANING APPARATUS</title><description>The present invention relates to a brush cleaning apparatus for cleaning a surface of a substrate. The apparatus comprises: a first cleaning brush coming in contact with the upper surface of a substrate by rotating; a second cleaning brush disposed at a lower portion of the first cleaning brush and coming in contact with the bottom surface of the surface by rotating; and a blocking part selectively blocking foreign matters falling from the first cleaning brush between the first cleaning brush and the second cleaning brush. Therefore, the apparatus can have an advantageous effect of preventing secondary contamination of the cleaning brush and ensuring uniform cleaning efficiency. 본 발명은 브러쉬 세정 장치에 관한 것으로, 기판의 표면을 세정하는 브러쉬 세정 장치는, 기판의 상면에 회전 접촉하는 제1세정브러쉬와, 제1세정브러쉬의 하부에 배치되며 기판의 저면에 회전 접촉하는 제2세정브러쉬와, 제1세정브러쉬와 제2세정브러쉬의 사이에서 선택적으로 제1세정브러쉬로부터 낙하하는 이물질을 차단하는 차단부를 포함하는 것에 의하여, 세정브러쉬의 2차 오염을 방지하고 세정 효율을 균일하게 보장하는 유리한 효과를 얻을 수 있다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJBwCgoN9lBw9nF19PP0c1dwDAhwDHIMCQ3mYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBoYWBgYmpubGxo7GxKkCAHCNIJM</recordid><startdate>20180504</startdate><enddate>20180504</enddate><creator>RYU, SEUNG HYEOK</creator><creator>SHIN, HYUNG HWAN</creator><scope>EVB</scope></search><sort><creationdate>20180504</creationdate><title>BRUSH CLEANING APPARATUS</title><author>RYU, SEUNG HYEOK ; SHIN, HYUNG HWAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20180045733A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2018</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>RYU, SEUNG HYEOK</creatorcontrib><creatorcontrib>SHIN, HYUNG HWAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RYU, SEUNG HYEOK</au><au>SHIN, HYUNG HWAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>BRUSH CLEANING APPARATUS</title><date>2018-05-04</date><risdate>2018</risdate><abstract>The present invention relates to a brush cleaning apparatus for cleaning a surface of a substrate. The apparatus comprises: a first cleaning brush coming in contact with the upper surface of a substrate by rotating; a second cleaning brush disposed at a lower portion of the first cleaning brush and coming in contact with the bottom surface of the surface by rotating; and a blocking part selectively blocking foreign matters falling from the first cleaning brush between the first cleaning brush and the second cleaning brush. Therefore, the apparatus can have an advantageous effect of preventing secondary contamination of the cleaning brush and ensuring uniform cleaning efficiency. 본 발명은 브러쉬 세정 장치에 관한 것으로, 기판의 표면을 세정하는 브러쉬 세정 장치는, 기판의 상면에 회전 접촉하는 제1세정브러쉬와, 제1세정브러쉬의 하부에 배치되며 기판의 저면에 회전 접촉하는 제2세정브러쉬와, 제1세정브러쉬와 제2세정브러쉬의 사이에서 선택적으로 제1세정브러쉬로부터 낙하하는 이물질을 차단하는 차단부를 포함하는 것에 의하여, 세정브러쉬의 2차 오염을 방지하고 세정 효율을 균일하게 보장하는 유리한 효과를 얻을 수 있다.</abstract><oa>free_for_read</oa></addata></record>
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subjects	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
title	BRUSH CLEANING APPARATUS
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