ADJUSTABLE SIDE GAS PLENUM FOR EDGE ETCH RATE CONTROL IN A DOWNSTREAM REACTOR

The present invention relates to a side tuning ring for a gas distribution device of a substrate processing system, comprising a first ring adjacent to a faceplate of a gas distribution device. The first ring surrounds the faceplate, defines a first plenum, communicates with a first gas source, and...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GUHA JOYDEEP, BRAVO ANDREW STRATTON, KUMAR JATINDER
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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