POLISHING COMPOSITION POLISHING METHOD AND METHOD FOR MANUFACTURING CERAMIC COMPONENT
저렴하며 또한 세라믹에 대해 고품위의 경면 마무리를 행할 수 있는 연마용 조성물을 제공한다. 연마용 조성물은, 탄화물을 포함하는 지립을 함유하고, 세라믹을 연마하기 위하여 사용된다. Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives made of carbide, and is used for...
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| creator | HISHIDA SHOTA OTSUKI SHINGO ITO YUUICHI ASAI MAIKO IKEDO TOMOYA MORINAGA HITOSHI |
| description | 저렴하며 또한 세라믹에 대해 고품위의 경면 마무리를 행할 수 있는 연마용 조성물을 제공한다. 연마용 조성물은, 탄화물을 포함하는 지립을 함유하고, 세라믹을 연마하기 위하여 사용된다.
Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives made of carbide, and is used for polishing ceramic. |
| format | Patent |
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Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives made of carbide, and is used for polishing ceramic.</description><language>eng ; kor</language><subject>ADHESIVES ; CHEMISTRY ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PERFORMING OPERATIONS ; POLISHES ; POLISHING ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; SKI WAXES ; TRANSPORTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170908&DB=EPODOC&CC=KR&NR=20170102207A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170908&DB=EPODOC&CC=KR&NR=20170102207A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HISHIDA SHOTA</creatorcontrib><creatorcontrib>OTSUKI SHINGO</creatorcontrib><creatorcontrib>ITO YUUICHI</creatorcontrib><creatorcontrib>ASAI MAIKO</creatorcontrib><creatorcontrib>IKEDO TOMOYA</creatorcontrib><creatorcontrib>MORINAGA HITOSHI</creatorcontrib><title>POLISHING COMPOSITION POLISHING METHOD AND METHOD FOR MANUFACTURING CERAMIC COMPONENT</title><description>저렴하며 또한 세라믹에 대해 고품위의 경면 마무리를 행할 수 있는 연마용 조성물을 제공한다. 연마용 조성물은, 탄화물을 포함하는 지립을 함유하고, 세라믹을 연마하기 위하여 사용된다.
Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives made of carbide, and is used for polishing ceramic.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>SKI WAXES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgN8PfxDPbw9HNXcPb3DfAP9gzx9PdTQIj6uoZ4-LsoOPq5wJhu_kEKvo5-oW6OziGhQWCdrkGOvp7OEBP8XP1CeBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJvHeQkYGhuYGhgZGRgbmjMXGqAFJdMYk</recordid><startdate>20170908</startdate><enddate>20170908</enddate><creator>HISHIDA SHOTA</creator><creator>OTSUKI SHINGO</creator><creator>ITO YUUICHI</creator><creator>ASAI MAIKO</creator><creator>IKEDO TOMOYA</creator><creator>MORINAGA HITOSHI</creator><scope>EVB</scope></search><sort><creationdate>20170908</creationdate><title>POLISHING COMPOSITION POLISHING METHOD AND METHOD FOR MANUFACTURING CERAMIC COMPONENT</title><author>HISHIDA SHOTA ; OTSUKI SHINGO ; ITO YUUICHI ; ASAI MAIKO ; IKEDO TOMOYA ; MORINAGA HITOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20170102207A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2017</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>SKI WAXES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HISHIDA SHOTA</creatorcontrib><creatorcontrib>OTSUKI SHINGO</creatorcontrib><creatorcontrib>ITO YUUICHI</creatorcontrib><creatorcontrib>ASAI MAIKO</creatorcontrib><creatorcontrib>IKEDO TOMOYA</creatorcontrib><creatorcontrib>MORINAGA HITOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HISHIDA SHOTA</au><au>OTSUKI SHINGO</au><au>ITO YUUICHI</au><au>ASAI MAIKO</au><au>IKEDO TOMOYA</au><au>MORINAGA HITOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLISHING COMPOSITION POLISHING METHOD AND METHOD FOR MANUFACTURING CERAMIC COMPONENT</title><date>2017-09-08</date><risdate>2017</risdate><abstract>저렴하며 또한 세라믹에 대해 고품위의 경면 마무리를 행할 수 있는 연마용 조성물을 제공한다. 연마용 조성물은, 탄화물을 포함하는 지립을 함유하고, 세라믹을 연마하기 위하여 사용된다.
Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives made of carbide, and is used for polishing ceramic.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; kor |
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| subjects | ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES TRANSPORTING |
| title | POLISHING COMPOSITION POLISHING METHOD AND METHOD FOR MANUFACTURING CERAMIC COMPONENT |
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