POLYMER ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS

화학식 1로 표현되는 구조단위 및 화학식 2로 표현되는 구조단위를 포함하는 중합체, 상기 중합체를 포함하는 유기막 조성물, 그리고 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. 상기 화학식 1 및 2의 정의는 명세서 내에 기재한 바와 같다. The present invention provides a polymer comprising a structure unit represented by chemical formula 1 below and a structure unit represented by chemical form...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MUN, SOO HYOUN, HEO, YU MI, NAM, YOUN HEE, KWON, HYO YOUNG, JUNG, HYEON IL, NAMGUNG, RAN, RATHWELL DOMINEA, SONG, HYUN JI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!