METHOD AND DEVICE OF CONTROLLING OF SUBSTRATE PROCESSING APPARATUS

The present invention relates to a control method for a substrate processing apparatus and a control apparatus thereof. The substrate processing apparatus includes: a vacuum chamber; a shower head which supplies process gas into the vacuum chamber while including a top plate exposed to the outside o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KWON, MIN JI, WANG, HYUN CHUL, LEE, NAE IL, LEE, KEUN HYUK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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