POLYMER ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS
The present invention relates to a polymer consisting of a structural unit represented by chemical formula 1 and a structural unit represented by chemical formula 2. The present invention further relates to an organic film composition containing the polymer, and to a pattern formation method using t...
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| creator | MUN, SOO HYOUN NAM, YOUN HEE KWON, HYO YOUNG SONG, HYUN JI |
| description | The present invention relates to a polymer consisting of a structural unit represented by chemical formula 1 and a structural unit represented by chemical formula 2. The present invention further relates to an organic film composition containing the polymer, and to a pattern formation method using the organic film composition. According to the present invention, it is possible to provide organic film materials securing gap-filling and flattening properties as well as mechanical properties such as etching resistance and film density. The detailed description of the chemical formulas 1 and 2 is the same as defined in the present specification.
화학식 1로 표현되는 구조단위 및 화학식 2로 표현되는 구조단위를 포함하는 중합체, 상기 중합체를 포함하는 유기막 조성물, 그리고 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. 상기 화학식 1 및 2의 정의는 명세서 내에 기재한 바와 같다. |
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화학식 1로 표현되는 구조단위 및 화학식 2로 표현되는 구조단위를 포함하는 중합체, 상기 중합체를 포함하는 유기막 조성물, 그리고 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. 상기 화학식 1 및 2의 정의는 명세서 내에 기재한 바와 같다.</description><language>eng ; kor</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; GENERAL PROCESSES OF COMPOUNDING ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170404&DB=EPODOC&CC=KR&NR=20170037441A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170404&DB=EPODOC&CC=KR&NR=20170037441A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MUN, SOO HYOUN</creatorcontrib><creatorcontrib>NAM, YOUN HEE</creatorcontrib><creatorcontrib>KWON, HYO YOUNG</creatorcontrib><creatorcontrib>SONG, HYUN JI</creatorcontrib><title>POLYMER ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS</title><description>The present invention relates to a polymer consisting of a structural unit represented by chemical formula 1 and a structural unit represented by chemical formula 2. The present invention further relates to an organic film composition containing the polymer, and to a pattern formation method using the organic film composition. According to the present invention, it is possible to provide organic film materials securing gap-filling and flattening properties as well as mechanical properties such as etching resistance and film density. The detailed description of the chemical formulas 1 and 2 is the same as defined in the present specification.
화학식 1로 표현되는 구조단위 및 화학식 2로 표현되는 구조단위를 포함하는 중합체, 상기 중합체를 포함하는 유기막 조성물, 그리고 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. 상기 화학식 1 및 2의 정의는 명세서 내에 기재한 바와 같다.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAI8PeJ9HUNUvAPcnf083RW8HGMBPKc_X0D_IM9Qzz9_RQc_VwUfF1DPPxdFPzdFNz8g3w9_dwVAhxDQlyD_IJ5GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakm8d5CRgaG5gYGxuYmJoaMxcaoAaYMrpQ</recordid><startdate>20170404</startdate><enddate>20170404</enddate><creator>MUN, SOO HYOUN</creator><creator>NAM, YOUN HEE</creator><creator>KWON, HYO YOUNG</creator><creator>SONG, HYUN JI</creator><scope>EVB</scope></search><sort><creationdate>20170404</creationdate><title>POLYMER ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS</title><author>MUN, SOO HYOUN ; NAM, YOUN HEE ; KWON, HYO YOUNG ; SONG, HYUN JI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20170037441A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2017</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>MUN, SOO HYOUN</creatorcontrib><creatorcontrib>NAM, YOUN HEE</creatorcontrib><creatorcontrib>KWON, HYO YOUNG</creatorcontrib><creatorcontrib>SONG, HYUN JI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MUN, SOO HYOUN</au><au>NAM, YOUN HEE</au><au>KWON, HYO YOUNG</au><au>SONG, HYUN JI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLYMER ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS</title><date>2017-04-04</date><risdate>2017</risdate><abstract>The present invention relates to a polymer consisting of a structural unit represented by chemical formula 1 and a structural unit represented by chemical formula 2. The present invention further relates to an organic film composition containing the polymer, and to a pattern formation method using the organic film composition. According to the present invention, it is possible to provide organic film materials securing gap-filling and flattening properties as well as mechanical properties such as etching resistance and film density. The detailed description of the chemical formulas 1 and 2 is the same as defined in the present specification.
화학식 1로 표현되는 구조단위 및 화학식 2로 표현되는 구조단위를 포함하는 중합체, 상기 중합체를 포함하는 유기막 조성물, 그리고 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. 상기 화학식 1 및 2의 정의는 명세서 내에 기재한 바와 같다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY GENERAL PROCESSES OF COMPOUNDING HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
| title | POLYMER ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS |
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