Manufacturing method for the mask
A mask manufacturing method is disclosed. The mask manufacturing method of the present invention comprises the steps of: processing a first hole to pass through a member from a first surface to a second surface with a laser on the member having the different first and second surfaces; and processing...
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| creator | CHANG, SOON CHUL MOON, YOUNG MIN MOON, MIN HO IM, SUNG SOON |
| description | A mask manufacturing method is disclosed. The mask manufacturing method of the present invention comprises the steps of: processing a first hole to pass through a member from a first surface to a second surface with a laser on the member having the different first and second surfaces; and processing a second hole by supplying an etching solution to at least one first hole of the first and second surfaces, and expanding the first hole.
본 발명은 마스크 제조방법을 개시한다. 본 발명은, 서로 상이한 제1 면과 제2 면을 갖는 부재 상에 레이저로 상기 제1 면으로부터 상기 제2 면으로 상기 부재를 관통하도록 제1 홀을 가공하는 단계와, 상기 제1 면 및 상기 제2 면 중 적어도 하나의 상기 제1 홀에 에칭액을 공급하여 상기 제1홀을 확장시켜 제2 홀을 가공하는 단계를 포함한다. |
| format | Patent |
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본 발명은 마스크 제조방법을 개시한다. 본 발명은, 서로 상이한 제1 면과 제2 면을 갖는 부재 상에 레이저로 상기 제1 면으로부터 상기 제2 면으로 상기 부재를 관통하도록 제1 홀을 가공하는 단계와, 상기 제1 면 및 상기 제2 면 중 적어도 하나의 상기 제1 홀에 에칭액을 공급하여 상기 제1홀을 확장시켜 제2 홀을 가공하는 단계를 포함한다.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170209&DB=EPODOC&CC=KR&NR=20170015787A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170209&DB=EPODOC&CC=KR&NR=20170015787A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHANG, SOON CHUL</creatorcontrib><creatorcontrib>MOON, YOUNG MIN</creatorcontrib><creatorcontrib>MOON, MIN HO</creatorcontrib><creatorcontrib>IM, SUNG SOON</creatorcontrib><title>Manufacturing method for the mask</title><description>A mask manufacturing method is disclosed. The mask manufacturing method of the present invention comprises the steps of: processing a first hole to pass through a member from a first surface to a second surface with a laser on the member having the different first and second surfaces; and processing a second hole by supplying an etching solution to at least one first hole of the first and second surfaces, and expanding the first hole.
본 발명은 마스크 제조방법을 개시한다. 본 발명은, 서로 상이한 제1 면과 제2 면을 갖는 부재 상에 레이저로 상기 제1 면으로부터 상기 제2 면으로 상기 부재를 관통하도록 제1 홀을 가공하는 단계와, 상기 제1 면 및 상기 제2 면 중 적어도 하나의 상기 제1 홀에 에칭액을 공급하여 상기 제1홀을 확장시켜 제2 홀을 가공하는 단계를 포함한다.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD0TcwrTUtMLiktysxLV8hNLcnIT1FIyy9SKMlIVchNLM7mYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBobmBgaGpuYW5o7GxKkCABWGJnk</recordid><startdate>20170209</startdate><enddate>20170209</enddate><creator>CHANG, SOON CHUL</creator><creator>MOON, YOUNG MIN</creator><creator>MOON, MIN HO</creator><creator>IM, SUNG SOON</creator><scope>EVB</scope></search><sort><creationdate>20170209</creationdate><title>Manufacturing method for the mask</title><author>CHANG, SOON CHUL ; MOON, YOUNG MIN ; MOON, MIN HO ; IM, SUNG SOON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20170015787A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>CHANG, SOON CHUL</creatorcontrib><creatorcontrib>MOON, YOUNG MIN</creatorcontrib><creatorcontrib>MOON, MIN HO</creatorcontrib><creatorcontrib>IM, SUNG SOON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHANG, SOON CHUL</au><au>MOON, YOUNG MIN</au><au>MOON, MIN HO</au><au>IM, SUNG SOON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Manufacturing method for the mask</title><date>2017-02-09</date><risdate>2017</risdate><abstract>A mask manufacturing method is disclosed. The mask manufacturing method of the present invention comprises the steps of: processing a first hole to pass through a member from a first surface to a second surface with a laser on the member having the different first and second surfaces; and processing a second hole by supplying an etching solution to at least one first hole of the first and second surfaces, and expanding the first hole.
본 발명은 마스크 제조방법을 개시한다. 본 발명은, 서로 상이한 제1 면과 제2 면을 갖는 부재 상에 레이저로 상기 제1 면으로부터 상기 제2 면으로 상기 부재를 관통하도록 제1 홀을 가공하는 단계와, 상기 제1 면 및 상기 제2 면 중 적어도 하나의 상기 제1 홀에 에칭액을 공급하여 상기 제1홀을 확장시켜 제2 홀을 가공하는 단계를 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; kor |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Manufacturing method for the mask |
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