Wire saw apparatus

A wire saw apparatus is provided. The wire saw apparatus includes: an ingot moving in a first direction; a wire cutting the ingot by being located on a path where the ingot moves; a pair of guide rollers moving the wire while the wire is wound around an outer circumference thereof; and a cleaning pa...

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Hauptverfasser: BAE, DONG WOO, KIM, NAM KI, WOO, NAM KYOO, BAIK, SUNG SUN, CHOI, HYO IL, JANG, SOON HO, JUNG, SEUNG GU
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Sprache:eng ; kor
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creator BAE, DONG WOO
KIM, NAM KI
WOO, NAM KYOO
BAIK, SUNG SUN
CHOI, HYO IL
JANG, SOON HO
JUNG, SEUNG GU
description A wire saw apparatus is provided. The wire saw apparatus includes: an ingot moving in a first direction; a wire cutting the ingot by being located on a path where the ingot moves; a pair of guide rollers moving the wire while the wire is wound around an outer circumference thereof; and a cleaning part cleaning the ingot passing the wire while being located between the pair of guide rollers. The cleaning part includes: a first bath which is filled with a cleaning solution, and has an accommodation groove capable of accommodating the ingot passing the wire; at least one ultrasonic wave generation part which is arranged on one side of the first bath, and vibrates the cleaning solution; and a second bath surrounding the first bath to accommodate the cleaning solution that overflowed from the first bath. The wire saw apparatus can improve the quality of a wafer by removing particles left on a wafers surface during a slicing process of cutting the ingot. 와이어 쏘 장치가 제공된다. 와이어 쏘 장치는 제1 방향으로 이동하는 잉곳, 상기 잉곳이 이동하는 경로 상에 위치하여 상기 잉곳을 절단하는 와이어, 상기 와이어가 외주면에 감겨져 상기 와이어를 이동시키는 한 쌍의 가이드 롤러 및 상기 한 쌍의 가이드 롤러 사이에 위치하여 상기 와이어를 통과한 잉곳을 세정하는 세정부를 포함하되. 상기 세정부는 내부에 세정액이 채워지고 상기 와이어를 통과한 잉곳을 수용할 수 있는 수용홈이 형성된 제1 배스, 상기 제1 배스의 일측면에 적어도 하나 이상 배치되되 상기 세정액을 진동시키기 위해 초음파를 발생시키는 초음파 발생부 및 상기 제1 배스에서 오버플로우되는 상기 세정액을 수용하기 위해 상기 제1 배스를 둘러싸는 제2 배스를 포함한다.
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The wire saw apparatus includes: an ingot moving in a first direction; a wire cutting the ingot by being located on a path where the ingot moves; a pair of guide rollers moving the wire while the wire is wound around an outer circumference thereof; and a cleaning part cleaning the ingot passing the wire while being located between the pair of guide rollers. The cleaning part includes: a first bath which is filled with a cleaning solution, and has an accommodation groove capable of accommodating the ingot passing the wire; at least one ultrasonic wave generation part which is arranged on one side of the first bath, and vibrates the cleaning solution; and a second bath surrounding the first bath to accommodate the cleaning solution that overflowed from the first bath. The wire saw apparatus can improve the quality of a wafer by removing particles left on a wafers surface during a slicing process of cutting the ingot. 와이어 쏘 장치가 제공된다. 와이어 쏘 장치는 제1 방향으로 이동하는 잉곳, 상기 잉곳이 이동하는 경로 상에 위치하여 상기 잉곳을 절단하는 와이어, 상기 와이어가 외주면에 감겨져 상기 와이어를 이동시키는 한 쌍의 가이드 롤러 및 상기 한 쌍의 가이드 롤러 사이에 위치하여 상기 와이어를 통과한 잉곳을 세정하는 세정부를 포함하되. 상기 세정부는 내부에 세정액이 채워지고 상기 와이어를 통과한 잉곳을 수용할 수 있는 수용홈이 형성된 제1 배스, 상기 제1 배스의 일측면에 적어도 하나 이상 배치되되 상기 세정액을 진동시키기 위해 초음파를 발생시키는 초음파 발생부 및 상기 제1 배스에서 오버플로우되는 상기 세정액을 수용하기 위해 상기 제1 배스를 둘러싸는 제2 배스를 포함한다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; BROACHING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FILING ; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOTOTHERWISE PROVIDED FOR ; MACHINE TOOLS ; METAL-WORKING NOT OTHERWISE PROVIDED FOR ; PERFORMING OPERATIONS ; PLANING ; SAWING ; SCRAPING ; SEMICONDUCTOR DEVICES ; SHEARING ; SLOTTING ; TRANSPORTING</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20161107&amp;DB=EPODOC&amp;CC=KR&amp;NR=20160128115A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20161107&amp;DB=EPODOC&amp;CC=KR&amp;NR=20160128115A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BAE, DONG WOO</creatorcontrib><creatorcontrib>KIM, NAM KI</creatorcontrib><creatorcontrib>WOO, NAM KYOO</creatorcontrib><creatorcontrib>BAIK, SUNG SUN</creatorcontrib><creatorcontrib>CHOI, HYO IL</creatorcontrib><creatorcontrib>JANG, SOON HO</creatorcontrib><creatorcontrib>JUNG, SEUNG GU</creatorcontrib><title>Wire saw apparatus</title><description>A wire saw apparatus is provided. The wire saw apparatus includes: an ingot moving in a first direction; a wire cutting the ingot by being located on a path where the ingot moves; a pair of guide rollers moving the wire while the wire is wound around an outer circumference thereof; and a cleaning part cleaning the ingot passing the wire while being located between the pair of guide rollers. The cleaning part includes: a first bath which is filled with a cleaning solution, and has an accommodation groove capable of accommodating the ingot passing the wire; at least one ultrasonic wave generation part which is arranged on one side of the first bath, and vibrates the cleaning solution; and a second bath surrounding the first bath to accommodate the cleaning solution that overflowed from the first bath. The wire saw apparatus can improve the quality of a wafer by removing particles left on a wafers surface during a slicing process of cutting the ingot. 와이어 쏘 장치가 제공된다. 와이어 쏘 장치는 제1 방향으로 이동하는 잉곳, 상기 잉곳이 이동하는 경로 상에 위치하여 상기 잉곳을 절단하는 와이어, 상기 와이어가 외주면에 감겨져 상기 와이어를 이동시키는 한 쌍의 가이드 롤러 및 상기 한 쌍의 가이드 롤러 사이에 위치하여 상기 와이어를 통과한 잉곳을 세정하는 세정부를 포함하되. 상기 세정부는 내부에 세정액이 채워지고 상기 와이어를 통과한 잉곳을 수용할 수 있는 수용홈이 형성된 제1 배스, 상기 제1 배스의 일측면에 적어도 하나 이상 배치되되 상기 세정액을 진동시키기 위해 초음파를 발생시키는 초음파 발생부 및 상기 제1 배스에서 오버플로우되는 상기 세정액을 수용하기 위해 상기 제1 배스를 둘러싸는 제2 배스를 포함한다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BROACHING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FILING</subject><subject>LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOTOTHERWISE PROVIDED FOR</subject><subject>MACHINE TOOLS</subject><subject>METAL-WORKING NOT OTHERWISE PROVIDED FOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PLANING</subject><subject>SAWING</subject><subject>SCRAPING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SHEARING</subject><subject>SLOTTING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAKzyxKVShOLFdILChILEosKS3mYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBoZmBoZGFoaGpo7GxKkCAG6nIL4</recordid><startdate>20161107</startdate><enddate>20161107</enddate><creator>BAE, DONG WOO</creator><creator>KIM, NAM KI</creator><creator>WOO, NAM KYOO</creator><creator>BAIK, SUNG SUN</creator><creator>CHOI, HYO IL</creator><creator>JANG, SOON HO</creator><creator>JUNG, SEUNG GU</creator><scope>EVB</scope></search><sort><creationdate>20161107</creationdate><title>Wire saw apparatus</title><author>BAE, DONG WOO ; KIM, NAM KI ; WOO, NAM KYOO ; BAIK, SUNG SUN ; CHOI, HYO IL ; JANG, SOON HO ; JUNG, SEUNG GU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20160128115A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2016</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BROACHING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FILING</topic><topic>LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOTOTHERWISE PROVIDED FOR</topic><topic>MACHINE TOOLS</topic><topic>METAL-WORKING NOT OTHERWISE PROVIDED FOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PLANING</topic><topic>SAWING</topic><topic>SCRAPING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SHEARING</topic><topic>SLOTTING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>BAE, DONG WOO</creatorcontrib><creatorcontrib>KIM, NAM KI</creatorcontrib><creatorcontrib>WOO, NAM KYOO</creatorcontrib><creatorcontrib>BAIK, SUNG SUN</creatorcontrib><creatorcontrib>CHOI, HYO IL</creatorcontrib><creatorcontrib>JANG, SOON HO</creatorcontrib><creatorcontrib>JUNG, SEUNG GU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BAE, DONG WOO</au><au>KIM, NAM KI</au><au>WOO, NAM KYOO</au><au>BAIK, SUNG SUN</au><au>CHOI, HYO IL</au><au>JANG, SOON HO</au><au>JUNG, SEUNG GU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Wire saw apparatus</title><date>2016-11-07</date><risdate>2016</risdate><abstract>A wire saw apparatus is provided. The wire saw apparatus includes: an ingot moving in a first direction; a wire cutting the ingot by being located on a path where the ingot moves; a pair of guide rollers moving the wire while the wire is wound around an outer circumference thereof; and a cleaning part cleaning the ingot passing the wire while being located between the pair of guide rollers. The cleaning part includes: a first bath which is filled with a cleaning solution, and has an accommodation groove capable of accommodating the ingot passing the wire; at least one ultrasonic wave generation part which is arranged on one side of the first bath, and vibrates the cleaning solution; and a second bath surrounding the first bath to accommodate the cleaning solution that overflowed from the first bath. The wire saw apparatus can improve the quality of a wafer by removing particles left on a wafers surface during a slicing process of cutting the ingot. 와이어 쏘 장치가 제공된다. 와이어 쏘 장치는 제1 방향으로 이동하는 잉곳, 상기 잉곳이 이동하는 경로 상에 위치하여 상기 잉곳을 절단하는 와이어, 상기 와이어가 외주면에 감겨져 상기 와이어를 이동시키는 한 쌍의 가이드 롤러 및 상기 한 쌍의 가이드 롤러 사이에 위치하여 상기 와이어를 통과한 잉곳을 세정하는 세정부를 포함하되. 상기 세정부는 내부에 세정액이 채워지고 상기 와이어를 통과한 잉곳을 수용할 수 있는 수용홈이 형성된 제1 배스, 상기 제1 배스의 일측면에 적어도 하나 이상 배치되되 상기 세정액을 진동시키기 위해 초음파를 발생시키는 초음파 발생부 및 상기 제1 배스에서 오버플로우되는 상기 세정액을 수용하기 위해 상기 제1 배스를 둘러싸는 제2 배스를 포함한다.</abstract><oa>free_for_read</oa></addata></record>
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recordid cdi_epo_espacenet_KR20160128115A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
BROACHING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FILING
LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOTOTHERWISE PROVIDED FOR
MACHINE TOOLS
METAL-WORKING NOT OTHERWISE PROVIDED FOR
PERFORMING OPERATIONS
PLANING
SAWING
SCRAPING
SEMICONDUCTOR DEVICES
SHEARING
SLOTTING
TRANSPORTING
title Wire saw apparatus
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