LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION
According to the present invention, provided are several inventions including a substrate processing device having multi-layer surfaces configured to face plasma and resist against corrosion. In one embodiment, the multi-layer surfaces can include a base layer of aluminum, anodized aluminum, or quar...
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| creator | SCHAEFER DAVID M LIU CHIN YI ANDERSON NASH W ORMOND RUSSELL |
| description | According to the present invention, provided are several inventions including a substrate processing device having multi-layer surfaces configured to face plasma and resist against corrosion. In one embodiment, the multi-layer surfaces can include a base layer of aluminum, anodized aluminum, or quartz, a first layer of stabilized zirconia, and a second layer of an yttrium-aluminum composite such as yttrium aluminum garnet (YAG).
이 개시에 따르면, 플라즈마를 향하고 그리고 부식에 대해 견디도록 구성된 멀티-층 표면들을 가진 기판 프로세싱 장치를 포함한, 몇몇의 발명들이 제공된다. 이들 멀티-층 표면들은 일 예에서 알루미늄, 양극 산화된 알루미늄, 또는 석영의 베이스 층, 안정화된 지르코니아의 제 1 층, 및 YAG (yttrium aluminum garnet) 와 같은 이트륨-알루미늄 합성물의 제 2 층을 포함할 수도 있다. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20160127667A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20160127667A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20160127667A3</originalsourceid><addsrcrecordid>eNrjZAj08fdzV_DxdHMN8fR1VQjxcA3ydfRRCA4IcoxUcPZ3DPEESrv5Bym4hjh7gNhApotrgH-wZ4inv5-Cs4ejr5NrkIJjQICPp7MjSIyHgTUtMac4lRdKczMou4E066YW5MenFhckJqfmpZbEewcZGRiaGRgamZuZmTsaE6cKAFYdMC4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION</title><source>esp@cenet</source><creator>SCHAEFER DAVID M ; LIU CHIN YI ; ANDERSON NASH W ; ORMOND RUSSELL</creator><creatorcontrib>SCHAEFER DAVID M ; LIU CHIN YI ; ANDERSON NASH W ; ORMOND RUSSELL</creatorcontrib><description>According to the present invention, provided are several inventions including a substrate processing device having multi-layer surfaces configured to face plasma and resist against corrosion. In one embodiment, the multi-layer surfaces can include a base layer of aluminum, anodized aluminum, or quartz, a first layer of stabilized zirconia, and a second layer of an yttrium-aluminum composite such as yttrium aluminum garnet (YAG).
이 개시에 따르면, 플라즈마를 향하고 그리고 부식에 대해 견디도록 구성된 멀티-층 표면들을 가진 기판 프로세싱 장치를 포함한, 몇몇의 발명들이 제공된다. 이들 멀티-층 표면들은 일 예에서 알루미늄, 양극 산화된 알루미늄, 또는 석영의 베이스 층, 안정화된 지르코니아의 제 1 층, 및 YAG (yttrium aluminum garnet) 와 같은 이트륨-알루미늄 합성물의 제 2 층을 포함할 수도 있다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161104&DB=EPODOC&CC=KR&NR=20160127667A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25546,76297</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161104&DB=EPODOC&CC=KR&NR=20160127667A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHAEFER DAVID M</creatorcontrib><creatorcontrib>LIU CHIN YI</creatorcontrib><creatorcontrib>ANDERSON NASH W</creatorcontrib><creatorcontrib>ORMOND RUSSELL</creatorcontrib><title>LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION</title><description>According to the present invention, provided are several inventions including a substrate processing device having multi-layer surfaces configured to face plasma and resist against corrosion. In one embodiment, the multi-layer surfaces can include a base layer of aluminum, anodized aluminum, or quartz, a first layer of stabilized zirconia, and a second layer of an yttrium-aluminum composite such as yttrium aluminum garnet (YAG).
이 개시에 따르면, 플라즈마를 향하고 그리고 부식에 대해 견디도록 구성된 멀티-층 표면들을 가진 기판 프로세싱 장치를 포함한, 몇몇의 발명들이 제공된다. 이들 멀티-층 표면들은 일 예에서 알루미늄, 양극 산화된 알루미늄, 또는 석영의 베이스 층, 안정화된 지르코니아의 제 1 층, 및 YAG (yttrium aluminum garnet) 와 같은 이트륨-알루미늄 합성물의 제 2 층을 포함할 수도 있다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAj08fdzV_DxdHMN8fR1VQjxcA3ydfRRCA4IcoxUcPZ3DPEESrv5Bym4hjh7gNhApotrgH-wZ4inv5-Cs4ejr5NrkIJjQICPp7MjSIyHgTUtMac4lRdKczMou4E066YW5MenFhckJqfmpZbEewcZGRiaGRgamZuZmTsaE6cKAFYdMC4</recordid><startdate>20161104</startdate><enddate>20161104</enddate><creator>SCHAEFER DAVID M</creator><creator>LIU CHIN YI</creator><creator>ANDERSON NASH W</creator><creator>ORMOND RUSSELL</creator><scope>EVB</scope></search><sort><creationdate>20161104</creationdate><title>LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION</title><author>SCHAEFER DAVID M ; LIU CHIN YI ; ANDERSON NASH W ; ORMOND RUSSELL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20160127667A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2016</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHAEFER DAVID M</creatorcontrib><creatorcontrib>LIU CHIN YI</creatorcontrib><creatorcontrib>ANDERSON NASH W</creatorcontrib><creatorcontrib>ORMOND RUSSELL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHAEFER DAVID M</au><au>LIU CHIN YI</au><au>ANDERSON NASH W</au><au>ORMOND RUSSELL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION</title><date>2016-11-04</date><risdate>2016</risdate><abstract>According to the present invention, provided are several inventions including a substrate processing device having multi-layer surfaces configured to face plasma and resist against corrosion. In one embodiment, the multi-layer surfaces can include a base layer of aluminum, anodized aluminum, or quartz, a first layer of stabilized zirconia, and a second layer of an yttrium-aluminum composite such as yttrium aluminum garnet (YAG).
이 개시에 따르면, 플라즈마를 향하고 그리고 부식에 대해 견디도록 구성된 멀티-층 표면들을 가진 기판 프로세싱 장치를 포함한, 몇몇의 발명들이 제공된다. 이들 멀티-층 표면들은 일 예에서 알루미늄, 양극 산화된 알루미늄, 또는 석영의 베이스 층, 안정화된 지르코니아의 제 1 층, 및 YAG (yttrium aluminum garnet) 와 같은 이트륨-알루미늄 합성물의 제 2 층을 포함할 수도 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION |
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