LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION

According to the present invention, provided are several inventions including a substrate processing device having multi-layer surfaces configured to face plasma and resist against corrosion. In one embodiment, the multi-layer surfaces can include a base layer of aluminum, anodized aluminum, or quar...

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Bibliographische Detailangaben
Hauptverfasser:	SCHAEFER DAVID M, LIU CHIN YI, ANDERSON NASH W, ORMOND RUSSELL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	According to the present invention, provided are several inventions including a substrate processing device having multi-layer surfaces configured to face plasma and resist against corrosion. In one embodiment, the multi-layer surfaces can include a base layer of aluminum, anodized aluminum, or quartz, a first layer of stabilized zirconia, and a second layer of an yttrium-aluminum composite such as yttrium aluminum garnet (YAG). 이 개시에 따르면, 플라즈마를 향하고 그리고 부식에 대해 견디도록 구성된 멀티-층 표면들을 가진 기판 프로세싱 장치를 포함한, 몇몇의 발명들이 제공된다. 이들 멀티-층 표면들은 일 예에서 알루미늄, 양극 산화된 알루미늄, 또는 석영의 베이스 층, 안정화된 지르코니아의 제 1 층, 및 YAG (yttrium aluminum garnet) 와 같은 이트륨-알루미늄 합성물의 제 2 층을 포함할 수도 있다.