APPARATUS FOR ETCHING
An etching apparatus is disclosed. The etching apparatus according to an embodiment of the present invention includes a process chamber for performing the etching process of a substrate; a viewport combined with the process chamber; a laser irradiation unit which is arranged on the outside of the pr...
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| creator | CHOI, KYO WON KANG, BYONG SIK CHOI, SUNG WON LEE, DONG HO |
| description | An etching apparatus is disclosed. The etching apparatus according to an embodiment of the present invention includes a process chamber for performing the etching process of a substrate; a viewport combined with the process chamber; a laser irradiation unit which is arranged on the outside of the process chamber and irradiates a laser to the substrate in the process chamber through the viewport; and a viewport deformation prevention unit which is combined with the viewport and prevents the deformation of the viewport. So, the accuracy of the etching process can be improved.
식각장치가 개시된다. 본 발명의 일 실시예에 따른 식각장치는, 기판의 식각 공정이 진행되는 공정챔버; 공정챔버에 결합되는 뷰포트(Viewport); 공정챔버의 외측에 배치되어 뷰포트를 통해 공정챔버 내부의 기판으로 레이저를 조사하는 레이저조사유닛; 및 뷰포트에 결합되어 뷰포트의 변형을 방지하는 뷰포트변형방지유닛을 포함한다. |
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식각장치가 개시된다. 본 발명의 일 실시예에 따른 식각장치는, 기판의 식각 공정이 진행되는 공정챔버; 공정챔버에 결합되는 뷰포트(Viewport); 공정챔버의 외측에 배치되어 뷰포트를 통해 공정챔버 내부의 기판으로 레이저를 조사하는 레이저조사유닛; 및 뷰포트에 결합되어 뷰포트의 변형을 방지하는 뷰포트변형방지유닛을 포함한다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160921&DB=EPODOC&CC=KR&NR=20160109839A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25546,76297</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160921&DB=EPODOC&CC=KR&NR=20160109839A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHOI, KYO WON</creatorcontrib><creatorcontrib>KANG, BYONG SIK</creatorcontrib><creatorcontrib>CHOI, SUNG WON</creatorcontrib><creatorcontrib>LEE, DONG HO</creatorcontrib><title>APPARATUS FOR ETCHING</title><description>An etching apparatus is disclosed. The etching apparatus according to an embodiment of the present invention includes a process chamber for performing the etching process of a substrate; a viewport combined with the process chamber; a laser irradiation unit which is arranged on the outside of the process chamber and irradiates a laser to the substrate in the process chamber through the viewport; and a viewport deformation prevention unit which is combined with the viewport and prevents the deformation of the viewport. So, the accuracy of the etching process can be improved.
식각장치가 개시된다. 본 발명의 일 실시예에 따른 식각장치는, 기판의 식각 공정이 진행되는 공정챔버; 공정챔버에 결합되는 뷰포트(Viewport); 공정챔버의 외측에 배치되어 뷰포트를 통해 공정챔버 내부의 기판으로 레이저를 조사하는 레이저조사유닛; 및 뷰포트에 결합되어 뷰포트의 변형을 방지하는 뷰포트변형방지유닛을 포함한다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB1DAhwDHIMCQ1WcPMPUnANcfbw9HPnYWBNS8wpTuWF0twMym4gKd3Ugvz41OKCxOTUvNSSeO8gIwNDMwNDA0sLY0tHY-JUAQAPBx_A</recordid><startdate>20160921</startdate><enddate>20160921</enddate><creator>CHOI, KYO WON</creator><creator>KANG, BYONG SIK</creator><creator>CHOI, SUNG WON</creator><creator>LEE, DONG HO</creator><scope>EVB</scope></search><sort><creationdate>20160921</creationdate><title>APPARATUS FOR ETCHING</title><author>CHOI, KYO WON ; KANG, BYONG SIK ; CHOI, SUNG WON ; LEE, DONG HO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20160109839A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2016</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>CHOI, KYO WON</creatorcontrib><creatorcontrib>KANG, BYONG SIK</creatorcontrib><creatorcontrib>CHOI, SUNG WON</creatorcontrib><creatorcontrib>LEE, DONG HO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHOI, KYO WON</au><au>KANG, BYONG SIK</au><au>CHOI, SUNG WON</au><au>LEE, DONG HO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS FOR ETCHING</title><date>2016-09-21</date><risdate>2016</risdate><abstract>An etching apparatus is disclosed. The etching apparatus according to an embodiment of the present invention includes a process chamber for performing the etching process of a substrate; a viewport combined with the process chamber; a laser irradiation unit which is arranged on the outside of the process chamber and irradiates a laser to the substrate in the process chamber through the viewport; and a viewport deformation prevention unit which is combined with the viewport and prevents the deformation of the viewport. So, the accuracy of the etching process can be improved.
식각장치가 개시된다. 본 발명의 일 실시예에 따른 식각장치는, 기판의 식각 공정이 진행되는 공정챔버; 공정챔버에 결합되는 뷰포트(Viewport); 공정챔버의 외측에 배치되어 뷰포트를 통해 공정챔버 내부의 기판으로 레이저를 조사하는 레이저조사유닛; 및 뷰포트에 결합되어 뷰포트의 변형을 방지하는 뷰포트변형방지유닛을 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| title | APPARATUS FOR ETCHING |
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