POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM AND DISPLAY DEVICE USING THE SAME
Provided are a positive photosensitive resin composition, a photosensitive resin film produced by the positive photosensitive resin composition and a display device comprising the photosensitive resin film. The positive photosensitive resin composition comprises: (A) an alkali-soluble resin; (B) a p...
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| creator | KANG, JIN HEE KANG, HEE KYOUNG HONG, CHUNG BEUM KIM, SANG SOO LEE, BUM JIN KIM, CHAN WOO KEE, SEUNG BEOM KIM, KI YONG CHO SUNG SEO |
| description | Provided are a positive photosensitive resin composition, a photosensitive resin film produced by the positive photosensitive resin composition and a display device comprising the photosensitive resin film. The positive photosensitive resin composition comprises: (A) an alkali-soluble resin; (B) a photosensitive diazoquinone compound; (C) an organic silane compound represented by chemical formula 1; and (D) a solvent. In the chemical formula 1, each substituent is the same as defined in the specification.
(A) 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; (C) 하기 화학식 1로 표시되는 유기실란 화합물; 및 (D) 용매를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 이를 포함하는 표시 소자를 제공한다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.) |
| format | Patent |
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(A) 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; (C) 하기 화학식 1로 표시되는 유기실란 화합물; 및 (D) 용매를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 이를 포함하는 표시 소자를 제공한다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160905&DB=EPODOC&CC=KR&NR=20160104380A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160905&DB=EPODOC&CC=KR&NR=20160104380A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KANG, JIN HEE</creatorcontrib><creatorcontrib>KANG, HEE KYOUNG</creatorcontrib><creatorcontrib>HONG, CHUNG BEUM</creatorcontrib><creatorcontrib>KIM, SANG SOO</creatorcontrib><creatorcontrib>LEE, BUM JIN</creatorcontrib><creatorcontrib>KIM, CHAN WOO</creatorcontrib><creatorcontrib>KEE, SEUNG BEOM</creatorcontrib><creatorcontrib>KIM, KI YONG</creatorcontrib><creatorcontrib>CHO SUNG SEO</creatorcontrib><title>POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM AND DISPLAY DEVICE USING THE SAME</title><description>Provided are a positive photosensitive resin composition, a photosensitive resin film produced by the positive photosensitive resin composition and a display device comprising the photosensitive resin film. The positive photosensitive resin composition comprises: (A) an alkali-soluble resin; (B) a photosensitive diazoquinone compound; (C) an organic silane compound represented by chemical formula 1; and (D) a solvent. In the chemical formula 1, each substituent is the same as defined in the specification.
(A) 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; (C) 하기 화학식 1로 표시되는 유기실란 화합물; 및 (D) 용매를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 이를 포함하는 표시 소자를 제공한다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEgL8A_2DPEMc1UI8PAP8Q929YNyg1yDPf0UnP19IQr8_XSwq3Dz9PFVcPRzUXDxDA7wcYxUcHEN83R2VQgFSrorhHi4KgQ7-rryMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjA0MzA0MDE2MLA0dj4lQBAPZMNmY</recordid><startdate>20160905</startdate><enddate>20160905</enddate><creator>KANG, JIN HEE</creator><creator>KANG, HEE KYOUNG</creator><creator>HONG, CHUNG BEUM</creator><creator>KIM, SANG SOO</creator><creator>LEE, BUM JIN</creator><creator>KIM, CHAN WOO</creator><creator>KEE, SEUNG BEOM</creator><creator>KIM, KI YONG</creator><creator>CHO SUNG SEO</creator><scope>EVB</scope></search><sort><creationdate>20160905</creationdate><title>POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM AND DISPLAY DEVICE USING THE SAME</title><author>KANG, JIN HEE ; KANG, HEE KYOUNG ; HONG, CHUNG BEUM ; KIM, SANG SOO ; LEE, BUM JIN ; KIM, CHAN WOO ; KEE, SEUNG BEOM ; KIM, KI YONG ; CHO SUNG SEO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20160104380A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>KANG, JIN HEE</creatorcontrib><creatorcontrib>KANG, HEE KYOUNG</creatorcontrib><creatorcontrib>HONG, CHUNG BEUM</creatorcontrib><creatorcontrib>KIM, SANG SOO</creatorcontrib><creatorcontrib>LEE, BUM JIN</creatorcontrib><creatorcontrib>KIM, CHAN WOO</creatorcontrib><creatorcontrib>KEE, SEUNG BEOM</creatorcontrib><creatorcontrib>KIM, KI YONG</creatorcontrib><creatorcontrib>CHO SUNG SEO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KANG, JIN HEE</au><au>KANG, HEE KYOUNG</au><au>HONG, CHUNG BEUM</au><au>KIM, SANG SOO</au><au>LEE, BUM JIN</au><au>KIM, CHAN WOO</au><au>KEE, SEUNG BEOM</au><au>KIM, KI YONG</au><au>CHO SUNG SEO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM AND DISPLAY DEVICE USING THE SAME</title><date>2016-09-05</date><risdate>2016</risdate><abstract>Provided are a positive photosensitive resin composition, a photosensitive resin film produced by the positive photosensitive resin composition and a display device comprising the photosensitive resin film. The positive photosensitive resin composition comprises: (A) an alkali-soluble resin; (B) a photosensitive diazoquinone compound; (C) an organic silane compound represented by chemical formula 1; and (D) a solvent. In the chemical formula 1, each substituent is the same as defined in the specification.
(A) 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; (C) 하기 화학식 1로 표시되는 유기실란 화합물; 및 (D) 용매를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 이를 포함하는 표시 소자를 제공한다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM AND DISPLAY DEVICE USING THE SAME |
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