OXIDE IMPLANT REMOVAL DEVICE
The present invention relates to a device of removing an oxide film on an implant, and more specifically, to a device of removing an oxide film on an implant, the device that is capable of securing hydrophilicity by removing an oxide film formed on a titanium coating layer of an implant fixture in t...
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| creator | GIM, SANG HEON KIM, GYU CHEON |
| description | The present invention relates to a device of removing an oxide film on an implant, and more specifically, to a device of removing an oxide film on an implant, the device that is capable of securing hydrophilicity by removing an oxide film formed on a titanium coating layer of an implant fixture in the process of distribution. A device of removing an oxide film on an implant according to the present invention includes: a chamber (10) including an internal space part; one or more of plasma gas generators (30) which are coupled to one side portion of the chamber (10), and which emit an atmospheric plasma gas into the chamber; a support (40) which is coupled to a bottom portion of the chamber (10), and which enables the fixture holder (53) to be positioned at a predetermined height; a fixture holder (53) which is coupled to the support (40) and fixes an implant fixture (60); an ozone filter (20) which is coupled to one side portion of the chamber (10) to remove ozone generated due to plasma gas; a vacuum pump which is connected to the ozone filter (20) to suck the ozone filter by vacuum pressure; and a controller which controls the components. A device of removing an oxide film on an implant according to the present invention has effects of removing an oxide film formed on an implant fixture within ten minutes, shortening removal time as much as half times or more compared to UV rays and others, improving cell adhesion as well as antimicrobial activities, and giving even bacteria suppressing functions.
본 발명은 임플란트 산화막 제거장치에 관한 것으로서, 보다 상세히는 유통과정중에 임플란트 픽스쳐의 티타늄 코팅층에 형성된 산화막을 제거하여 친수성을 확보할 수 있는 것을 특징으로 하는 임플란트 산화막 제거장치에 관한 것이다. 본 발명은 내부 공간부를 구비한 챔버(10)와; 상기 챔버(10) 일측부에 체결되며, 대기압 플라즈마 가스를 챔버내로 방출하는 한 개 이상의 플라즈마 가스 발생장치(30)와; 상기 챔버(10) 하단부에 체결되며, 픽스쳐 홀더(53)를 일정높이에 위치하게 하는 지지대(40)와; 상기 지지대(40)와 체결되며, 임플란트 픽스쳐(60)를 고정하는 픽스쳐 홀더(53)와; 상기 챔버(10) 일측부에 체결되며, 플라즈마 가스로 인하여 발생되는 오존을 제거하기 위한 오존 필터(20)와; 상기 오존 필터(20)와 연결되어 진공압력으로 흡입하는 진공펌프와; 상기 구성요소를 제어하는 컨트롤러;를 구비하는 것을 특징으로 한다. 본 발명은 10분 이내로 임플란트 픽스쳐에 형성된 산화막을 제거할 수 있으며, UV등에 비하여 제거시간을 1/2배 이상 단축 시킬수 있으며, 항균성 뿐만 아니라 세포 부착성이 향상되며, 세균 억제기능까지도 부여하는 효과를 가진다. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20160049683A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20160049683A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20160049683A3</originalsourceid><addsrcrecordid>eNrjZJDxj_B0cVXw9A3wcfQLUQhy9fUPc_RRcHEN83R25WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGZgYGJpZmFsaOxsSpAgDtOiGh</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>OXIDE IMPLANT REMOVAL DEVICE</title><source>esp@cenet</source><creator>GIM, SANG HEON ; KIM, GYU CHEON</creator><creatorcontrib>GIM, SANG HEON ; KIM, GYU CHEON</creatorcontrib><description>The present invention relates to a device of removing an oxide film on an implant, and more specifically, to a device of removing an oxide film on an implant, the device that is capable of securing hydrophilicity by removing an oxide film formed on a titanium coating layer of an implant fixture in the process of distribution. A device of removing an oxide film on an implant according to the present invention includes: a chamber (10) including an internal space part; one or more of plasma gas generators (30) which are coupled to one side portion of the chamber (10), and which emit an atmospheric plasma gas into the chamber; a support (40) which is coupled to a bottom portion of the chamber (10), and which enables the fixture holder (53) to be positioned at a predetermined height; a fixture holder (53) which is coupled to the support (40) and fixes an implant fixture (60); an ozone filter (20) which is coupled to one side portion of the chamber (10) to remove ozone generated due to plasma gas; a vacuum pump which is connected to the ozone filter (20) to suck the ozone filter by vacuum pressure; and a controller which controls the components. A device of removing an oxide film on an implant according to the present invention has effects of removing an oxide film formed on an implant fixture within ten minutes, shortening removal time as much as half times or more compared to UV rays and others, improving cell adhesion as well as antimicrobial activities, and giving even bacteria suppressing functions.
본 발명은 임플란트 산화막 제거장치에 관한 것으로서, 보다 상세히는 유통과정중에 임플란트 픽스쳐의 티타늄 코팅층에 형성된 산화막을 제거하여 친수성을 확보할 수 있는 것을 특징으로 하는 임플란트 산화막 제거장치에 관한 것이다. 본 발명은 내부 공간부를 구비한 챔버(10)와; 상기 챔버(10) 일측부에 체결되며, 대기압 플라즈마 가스를 챔버내로 방출하는 한 개 이상의 플라즈마 가스 발생장치(30)와; 상기 챔버(10) 하단부에 체결되며, 픽스쳐 홀더(53)를 일정높이에 위치하게 하는 지지대(40)와; 상기 지지대(40)와 체결되며, 임플란트 픽스쳐(60)를 고정하는 픽스쳐 홀더(53)와; 상기 챔버(10) 일측부에 체결되며, 플라즈마 가스로 인하여 발생되는 오존을 제거하기 위한 오존 필터(20)와; 상기 오존 필터(20)와 연결되어 진공압력으로 흡입하는 진공펌프와; 상기 구성요소를 제어하는 컨트롤러;를 구비하는 것을 특징으로 한다. 본 발명은 10분 이내로 임플란트 픽스쳐에 형성된 산화막을 제거할 수 있으며, UV등에 비하여 제거시간을 1/2배 이상 단축 시킬수 있으며, 항균성 뿐만 아니라 세포 부착성이 향상되며, 세균 억제기능까지도 부여하는 효과를 가진다.</description><language>eng ; kor</language><subject>APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE ; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES ; DENTISTRY ; DISINFECTION, STERILISATION, OR DEODORISATION OF AIR ; HUMAN NECESSITIES ; HYGIENE ; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES ; MEDICAL OR VETERINARY SCIENCE ; METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160510&DB=EPODOC&CC=KR&NR=20160049683A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160510&DB=EPODOC&CC=KR&NR=20160049683A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GIM, SANG HEON</creatorcontrib><creatorcontrib>KIM, GYU CHEON</creatorcontrib><title>OXIDE IMPLANT REMOVAL DEVICE</title><description>The present invention relates to a device of removing an oxide film on an implant, and more specifically, to a device of removing an oxide film on an implant, the device that is capable of securing hydrophilicity by removing an oxide film formed on a titanium coating layer of an implant fixture in the process of distribution. A device of removing an oxide film on an implant according to the present invention includes: a chamber (10) including an internal space part; one or more of plasma gas generators (30) which are coupled to one side portion of the chamber (10), and which emit an atmospheric plasma gas into the chamber; a support (40) which is coupled to a bottom portion of the chamber (10), and which enables the fixture holder (53) to be positioned at a predetermined height; a fixture holder (53) which is coupled to the support (40) and fixes an implant fixture (60); an ozone filter (20) which is coupled to one side portion of the chamber (10) to remove ozone generated due to plasma gas; a vacuum pump which is connected to the ozone filter (20) to suck the ozone filter by vacuum pressure; and a controller which controls the components. A device of removing an oxide film on an implant according to the present invention has effects of removing an oxide film formed on an implant fixture within ten minutes, shortening removal time as much as half times or more compared to UV rays and others, improving cell adhesion as well as antimicrobial activities, and giving even bacteria suppressing functions.
본 발명은 임플란트 산화막 제거장치에 관한 것으로서, 보다 상세히는 유통과정중에 임플란트 픽스쳐의 티타늄 코팅층에 형성된 산화막을 제거하여 친수성을 확보할 수 있는 것을 특징으로 하는 임플란트 산화막 제거장치에 관한 것이다. 본 발명은 내부 공간부를 구비한 챔버(10)와; 상기 챔버(10) 일측부에 체결되며, 대기압 플라즈마 가스를 챔버내로 방출하는 한 개 이상의 플라즈마 가스 발생장치(30)와; 상기 챔버(10) 하단부에 체결되며, 픽스쳐 홀더(53)를 일정높이에 위치하게 하는 지지대(40)와; 상기 지지대(40)와 체결되며, 임플란트 픽스쳐(60)를 고정하는 픽스쳐 홀더(53)와; 상기 챔버(10) 일측부에 체결되며, 플라즈마 가스로 인하여 발생되는 오존을 제거하기 위한 오존 필터(20)와; 상기 오존 필터(20)와 연결되어 진공압력으로 흡입하는 진공펌프와; 상기 구성요소를 제어하는 컨트롤러;를 구비하는 것을 특징으로 한다. 본 발명은 10분 이내로 임플란트 픽스쳐에 형성된 산화막을 제거할 수 있으며, UV등에 비하여 제거시간을 1/2배 이상 단축 시킬수 있으며, 항균성 뿐만 아니라 세포 부착성이 향상되며, 세균 억제기능까지도 부여하는 효과를 가진다.</description><subject>APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE</subject><subject>CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES</subject><subject>DENTISTRY</subject><subject>DISINFECTION, STERILISATION, OR DEODORISATION OF AIR</subject><subject>HUMAN NECESSITIES</subject><subject>HYGIENE</subject><subject>MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES</subject><subject>MEDICAL OR VETERINARY SCIENCE</subject><subject>METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJDxj_B0cVXw9A3wcfQLUQhy9fUPc_RRcHEN83R25WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGZgYGJpZmFsaOxsSpAgDtOiGh</recordid><startdate>20160510</startdate><enddate>20160510</enddate><creator>GIM, SANG HEON</creator><creator>KIM, GYU CHEON</creator><scope>EVB</scope></search><sort><creationdate>20160510</creationdate><title>OXIDE IMPLANT REMOVAL DEVICE</title><author>GIM, SANG HEON ; KIM, GYU CHEON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20160049683A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2016</creationdate><topic>APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE</topic><topic>CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES</topic><topic>DENTISTRY</topic><topic>DISINFECTION, STERILISATION, OR DEODORISATION OF AIR</topic><topic>HUMAN NECESSITIES</topic><topic>HYGIENE</topic><topic>MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES</topic><topic>MEDICAL OR VETERINARY SCIENCE</topic><topic>METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>GIM, SANG HEON</creatorcontrib><creatorcontrib>KIM, GYU CHEON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GIM, SANG HEON</au><au>KIM, GYU CHEON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>OXIDE IMPLANT REMOVAL DEVICE</title><date>2016-05-10</date><risdate>2016</risdate><abstract>The present invention relates to a device of removing an oxide film on an implant, and more specifically, to a device of removing an oxide film on an implant, the device that is capable of securing hydrophilicity by removing an oxide film formed on a titanium coating layer of an implant fixture in the process of distribution. A device of removing an oxide film on an implant according to the present invention includes: a chamber (10) including an internal space part; one or more of plasma gas generators (30) which are coupled to one side portion of the chamber (10), and which emit an atmospheric plasma gas into the chamber; a support (40) which is coupled to a bottom portion of the chamber (10), and which enables the fixture holder (53) to be positioned at a predetermined height; a fixture holder (53) which is coupled to the support (40) and fixes an implant fixture (60); an ozone filter (20) which is coupled to one side portion of the chamber (10) to remove ozone generated due to plasma gas; a vacuum pump which is connected to the ozone filter (20) to suck the ozone filter by vacuum pressure; and a controller which controls the components. A device of removing an oxide film on an implant according to the present invention has effects of removing an oxide film formed on an implant fixture within ten minutes, shortening removal time as much as half times or more compared to UV rays and others, improving cell adhesion as well as antimicrobial activities, and giving even bacteria suppressing functions.
본 발명은 임플란트 산화막 제거장치에 관한 것으로서, 보다 상세히는 유통과정중에 임플란트 픽스쳐의 티타늄 코팅층에 형성된 산화막을 제거하여 친수성을 확보할 수 있는 것을 특징으로 하는 임플란트 산화막 제거장치에 관한 것이다. 본 발명은 내부 공간부를 구비한 챔버(10)와; 상기 챔버(10) 일측부에 체결되며, 대기압 플라즈마 가스를 챔버내로 방출하는 한 개 이상의 플라즈마 가스 발생장치(30)와; 상기 챔버(10) 하단부에 체결되며, 픽스쳐 홀더(53)를 일정높이에 위치하게 하는 지지대(40)와; 상기 지지대(40)와 체결되며, 임플란트 픽스쳐(60)를 고정하는 픽스쳐 홀더(53)와; 상기 챔버(10) 일측부에 체결되며, 플라즈마 가스로 인하여 발생되는 오존을 제거하기 위한 오존 필터(20)와; 상기 오존 필터(20)와 연결되어 진공압력으로 흡입하는 진공펌프와; 상기 구성요소를 제어하는 컨트롤러;를 구비하는 것을 특징으로 한다. 본 발명은 10분 이내로 임플란트 픽스쳐에 형성된 산화막을 제거할 수 있으며, UV등에 비하여 제거시간을 1/2배 이상 단축 시킬수 있으며, 항균성 뿐만 아니라 세포 부착성이 향상되며, 세균 억제기능까지도 부여하는 효과를 가진다.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; kor |
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| subjects | APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES DENTISTRY DISINFECTION, STERILISATION, OR DEODORISATION OF AIR HUMAN NECESSITIES HYGIENE MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES MEDICAL OR VETERINARY SCIENCE METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL |
| title | OXIDE IMPLANT REMOVAL DEVICE |
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