SEMICONDUCTOR DEVICE INCLUDING FIN-TYPE FIELD EFFECT TRANSISTOR

According to a technical concept of the present invention, a semiconductor device comprises: a semiconductor substrate; a fin-type structure formed on the semiconductor substrate; an insulation layer formed on the semiconductor substrate to have an upper surface lower than an upper surface of the fi...

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1. Verfasser: DONG YAOQI
Format: Patent
Sprache:eng ; kor
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