DEVICE AND METHOD FOR TRANSFERRING SUBSTRATE FOR FORMING COMPOUND SEMICONDUCTOR FILM, AND SYSTEM AND METHOD FOR FORMING COMPOUND SEMICONDUCTOR FILM

전달 장치(170)는 기판 홀더(40)를 지지하는 지지부(70)와, 기판 홀더(40)의 기판 유지부(80)에서 기판을 승강 가능한 승강 부재(91)와, 승강 부재(91)의 승강에 따라 승강하고, 승강 부재(91)가 기판(W)을 수취할 때에, 기판(W)과 승강 부재(91)의 사이에 개재되고, 기판(W)이 기판 유지부(80)에 유지된 때에, 기판(W)의 이면측에서 기판 홀더(40)의 승강 부재(91)가 삽통하는 구멍(81)을 차폐하는 차폐 부재(82)를 가진다. 그리고, 승강 부재(91)가 상승한 상태에서, 반송 장치(201)에 의해,...

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Hauptverfasser: MORISAKI EISUKE, KIMOTO TOMOHISA
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KIMOTO TOMOHISA
description 전달 장치(170)는 기판 홀더(40)를 지지하는 지지부(70)와, 기판 홀더(40)의 기판 유지부(80)에서 기판을 승강 가능한 승강 부재(91)와, 승강 부재(91)의 승강에 따라 승강하고, 승강 부재(91)가 기판(W)을 수취할 때에, 기판(W)과 승강 부재(91)의 사이에 개재되고, 기판(W)이 기판 유지부(80)에 유지된 때에, 기판(W)의 이면측에서 기판 홀더(40)의 승강 부재(91)가 삽통하는 구멍(81)을 차폐하는 차폐 부재(82)를 가진다. 그리고, 승강 부재(91)가 상승한 상태에서, 반송 장치(201)에 의해, 차폐 부재(82) 위에 기판(W)을 탑재하거나, 또는 차폐 부재(82) 상의 기판(W)을 반송한다. A transferring device includes a supporting part configured to support a substrate holder, an elevation member configured to raise and lower a substrate at a substrate holding portion of the substrate holder, and a shielding member configured to be raised and lowered by the elevation member. The shielding member is interposed between the substrate and the elevation member when the elevation member receives the substrate. When the substrate is held on the substrate holding portion, the shielding member shields, at a backside of the substrate, a hole in the substrate holder through which the elevation member is inserted. In a state where the elevation member is raised, the substrate is mounted on the shielding member, or the substrate on shielding member is transferred therefrom.
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A transferring device includes a supporting part configured to support a substrate holder, an elevation member configured to raise and lower a substrate at a substrate holding portion of the substrate holder, and a shielding member configured to be raised and lowered by the elevation member. The shielding member is interposed between the substrate and the elevation member when the elevation member receives the substrate. When the substrate is held on the substrate holding portion, the shielding member shields, at a backside of the substrate, a hole in the substrate holder through which the elevation member is inserted. 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A transferring device includes a supporting part configured to support a substrate holder, an elevation member configured to raise and lower a substrate at a substrate holding portion of the substrate holder, and a shielding member configured to be raised and lowered by the elevation member. The shielding member is interposed between the substrate and the elevation member when the elevation member receives the substrate. When the substrate is held on the substrate holding portion, the shielding member shields, at a backside of the substrate, a hole in the substrate holder through which the elevation member is inserted. 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A transferring device includes a supporting part configured to support a substrate holder, an elevation member configured to raise and lower a substrate at a substrate holding portion of the substrate holder, and a shielding member configured to be raised and lowered by the elevation member. The shielding member is interposed between the substrate and the elevation member when the elevation member receives the substrate. When the substrate is held on the substrate holding portion, the shielding member shields, at a backside of the substrate, a hole in the substrate holder through which the elevation member is inserted. In a state where the elevation member is raised, the substrate is mounted on the shielding member, or the substrate on shielding member is transferred therefrom.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title DEVICE AND METHOD FOR TRANSFERRING SUBSTRATE FOR FORMING COMPOUND SEMICONDUCTOR FILM, AND SYSTEM AND METHOD FOR FORMING COMPOUND SEMICONDUCTOR FILM
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