POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PREPARED BY USING THE SAME AND DISPLAY DEVICE

Provided are a positive-type photosensitive resin composition having excellent sensitivity, reliability, storage stability, etc., a photosensitive resin film produced by using the same, and a display device. The positive photosensitive resin composition comprises: (A) an alkali-soluble resin represe...

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Bibliographische Detailangaben
Hauptverfasser:	KANG, JIN HEE, LEE, SANG HAENG, KIM, SANG KYEON, NOH, KUN BAE, LEE, BUM JIN, KIM, SANG SOO, LEE, JONG HWA, BAEK, JAE YEOL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	Provided are a positive-type photosensitive resin composition having excellent sensitivity, reliability, storage stability, etc., a photosensitive resin film produced by using the same, and a display device. The positive photosensitive resin composition comprises: (A) an alkali-soluble resin represented by chemical formula 1; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent. In the chemical formula 1, each substituent is the same as defined in the specification. (A) 하기 화학식 1로 표시되는 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; (C) 열산발생제; 및 (D) 용매를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 디스플레이 소자가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기의 정의는 명세서에 기재된 바와 같다.)