SUBSTRATE TREATING APPARATUS

The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to an embodiment of the present invention comprises: a process chamber; a substrate support unit; an antenna; and a dielectric plate. The dielectric plate has a base plate and a lower plat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JANG, YONG SU, KIM, SUN RAE, HONG, SUNG HWAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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