PROTECTION APPARATUS FOR OPTICAL FIBER IN PLASMA PROCESS
Optical measurement is performed using an optical fiber for optical measurement in a process of using plasma such as a deposition process in fields of a semiconductor, display, and solar cell. The field where the optical fiber is mainly used is a sputter deposition process wherein the optical fiber...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | YUN, MYOUNG SOO JO, TAE HOON PARK, HYE JIN WOO, WON KYUN CHA, SUNG DUK KWON, GI CHUNG |
| description | Optical measurement is performed using an optical fiber for optical measurement in a process of using plasma such as a deposition process in fields of a semiconductor, display, and solar cell. The field where the optical fiber is mainly used is a sputter deposition process wherein the optical fiber is positioned near the plasma to perform the optical measurement. The purpose of a protection apparatus for an optical fiber is to prevent contamination of the optical fiber since a measured luminous intensity is decreased to interfere the accurate optical measurement for the plasma when the optical fiber is contaminated.
반도체, 디스플레이, 태양전지 분야의 증착 공정 등 플라즈마를 사용한 공정에서 광학측정을 위해 광파이버를 이용해 광학측정을 진행하게 된다. 주로 사용되는 분야는 스퍼터 증착과정이며 이때 광파이버는 플라즈마 부근에 위치하여 광학측정을 진행한다. 이 때 타겟으로부터 스퍼터 된 물질들이 광파이버 앞 렌즈부분에 증착이 된다. 광파이버가 오염이 되면 측정되는 광도가 떨어져 정확한 플라즈마 광학측정을 하기 어렵기 때문에 이를 방지하기 위하여 광파이버 보호장치를 개발하게 되었다. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20150137710A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20150137710A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20150137710A3</originalsourceid><addsrcrecordid>eNrjZLAICPIPcXUO8fT3U3AMCHAMcgwJDVZw8w9S8A8I8XR29FFw83RyDVLw9FMI8HEM9nVUAGpwdg0O5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGpgaGxubmhgaOxsSpAgAP-ClY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PROTECTION APPARATUS FOR OPTICAL FIBER IN PLASMA PROCESS</title><source>esp@cenet</source><creator>YUN, MYOUNG SOO ; JO, TAE HOON ; PARK, HYE JIN ; WOO, WON KYUN ; CHA, SUNG DUK ; KWON, GI CHUNG</creator><creatorcontrib>YUN, MYOUNG SOO ; JO, TAE HOON ; PARK, HYE JIN ; WOO, WON KYUN ; CHA, SUNG DUK ; KWON, GI CHUNG</creatorcontrib><description>Optical measurement is performed using an optical fiber for optical measurement in a process of using plasma such as a deposition process in fields of a semiconductor, display, and solar cell. The field where the optical fiber is mainly used is a sputter deposition process wherein the optical fiber is positioned near the plasma to perform the optical measurement. The purpose of a protection apparatus for an optical fiber is to prevent contamination of the optical fiber since a measured luminous intensity is decreased to interfere the accurate optical measurement for the plasma when the optical fiber is contaminated.
반도체, 디스플레이, 태양전지 분야의 증착 공정 등 플라즈마를 사용한 공정에서 광학측정을 위해 광파이버를 이용해 광학측정을 진행하게 된다. 주로 사용되는 분야는 스퍼터 증착과정이며 이때 광파이버는 플라즈마 부근에 위치하여 광학측정을 진행한다. 이 때 타겟으로부터 스퍼터 된 물질들이 광파이버 앞 렌즈부분에 증착이 된다. 광파이버가 오염이 되면 측정되는 광도가 떨어져 정확한 플라즈마 광학측정을 하기 어렵기 때문에 이를 방지하기 위하여 광파이버 보호장치를 개발하게 되었다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151209&DB=EPODOC&CC=KR&NR=20150137710A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20151209&DB=EPODOC&CC=KR&NR=20150137710A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YUN, MYOUNG SOO</creatorcontrib><creatorcontrib>JO, TAE HOON</creatorcontrib><creatorcontrib>PARK, HYE JIN</creatorcontrib><creatorcontrib>WOO, WON KYUN</creatorcontrib><creatorcontrib>CHA, SUNG DUK</creatorcontrib><creatorcontrib>KWON, GI CHUNG</creatorcontrib><title>PROTECTION APPARATUS FOR OPTICAL FIBER IN PLASMA PROCESS</title><description>Optical measurement is performed using an optical fiber for optical measurement in a process of using plasma such as a deposition process in fields of a semiconductor, display, and solar cell. The field where the optical fiber is mainly used is a sputter deposition process wherein the optical fiber is positioned near the plasma to perform the optical measurement. The purpose of a protection apparatus for an optical fiber is to prevent contamination of the optical fiber since a measured luminous intensity is decreased to interfere the accurate optical measurement for the plasma when the optical fiber is contaminated.
반도체, 디스플레이, 태양전지 분야의 증착 공정 등 플라즈마를 사용한 공정에서 광학측정을 위해 광파이버를 이용해 광학측정을 진행하게 된다. 주로 사용되는 분야는 스퍼터 증착과정이며 이때 광파이버는 플라즈마 부근에 위치하여 광학측정을 진행한다. 이 때 타겟으로부터 스퍼터 된 물질들이 광파이버 앞 렌즈부분에 증착이 된다. 광파이버가 오염이 되면 측정되는 광도가 떨어져 정확한 플라즈마 광학측정을 하기 어렵기 때문에 이를 방지하기 위하여 광파이버 보호장치를 개발하게 되었다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAICPIPcXUO8fT3U3AMCHAMcgwJDVZw8w9S8A8I8XR29FFw83RyDVLw9FMI8HEM9nVUAGpwdg0O5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGpgaGxubmhgaOxsSpAgAP-ClY</recordid><startdate>20151209</startdate><enddate>20151209</enddate><creator>YUN, MYOUNG SOO</creator><creator>JO, TAE HOON</creator><creator>PARK, HYE JIN</creator><creator>WOO, WON KYUN</creator><creator>CHA, SUNG DUK</creator><creator>KWON, GI CHUNG</creator><scope>EVB</scope></search><sort><creationdate>20151209</creationdate><title>PROTECTION APPARATUS FOR OPTICAL FIBER IN PLASMA PROCESS</title><author>YUN, MYOUNG SOO ; JO, TAE HOON ; PARK, HYE JIN ; WOO, WON KYUN ; CHA, SUNG DUK ; KWON, GI CHUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20150137710A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2015</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>YUN, MYOUNG SOO</creatorcontrib><creatorcontrib>JO, TAE HOON</creatorcontrib><creatorcontrib>PARK, HYE JIN</creatorcontrib><creatorcontrib>WOO, WON KYUN</creatorcontrib><creatorcontrib>CHA, SUNG DUK</creatorcontrib><creatorcontrib>KWON, GI CHUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YUN, MYOUNG SOO</au><au>JO, TAE HOON</au><au>PARK, HYE JIN</au><au>WOO, WON KYUN</au><au>CHA, SUNG DUK</au><au>KWON, GI CHUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROTECTION APPARATUS FOR OPTICAL FIBER IN PLASMA PROCESS</title><date>2015-12-09</date><risdate>2015</risdate><abstract>Optical measurement is performed using an optical fiber for optical measurement in a process of using plasma such as a deposition process in fields of a semiconductor, display, and solar cell. The field where the optical fiber is mainly used is a sputter deposition process wherein the optical fiber is positioned near the plasma to perform the optical measurement. The purpose of a protection apparatus for an optical fiber is to prevent contamination of the optical fiber since a measured luminous intensity is decreased to interfere the accurate optical measurement for the plasma when the optical fiber is contaminated.
반도체, 디스플레이, 태양전지 분야의 증착 공정 등 플라즈마를 사용한 공정에서 광학측정을 위해 광파이버를 이용해 광학측정을 진행하게 된다. 주로 사용되는 분야는 스퍼터 증착과정이며 이때 광파이버는 플라즈마 부근에 위치하여 광학측정을 진행한다. 이 때 타겟으로부터 스퍼터 된 물질들이 광파이버 앞 렌즈부분에 증착이 된다. 광파이버가 오염이 되면 측정되는 광도가 떨어져 정확한 플라즈마 광학측정을 하기 어렵기 때문에 이를 방지하기 위하여 광파이버 보호장치를 개발하게 되었다.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; kor |
| recordid | cdi_epo_espacenet_KR20150137710A |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PROTECTION APPARATUS FOR OPTICAL FIBER IN PLASMA PROCESS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T17%3A37%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YUN,%20MYOUNG%20SOO&rft.date=2015-12-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20150137710A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |