BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

극자외(extreme ultraviolet) 광원용 시스템은, 타겟 재료와 상호작용하는 조사 증폭 광빔(irradiating amplified light beam)의 적어도 일부분의 반사를 포함하는 반사 증폭 광빔을 수신하고 반사 증폭 광빔을 제1 채널, 제2 채널, 및 제3 채널로 지향시키도록 위치된 하나 이상의 광학 요소와, 제1 채널로부터의 광을 감지하는 제1 센서와, 제2 채널 및 제3 채널로부터의 광을 감지하며, 제1 센서보다 낮은 획득률을 갖는 제2 센서를 포함한다. A system for an extreme ultrav...

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Hauptverfasser: FOMENKOV IGOR V, FLEUROV VLADIMIR B
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Sprache:eng ; kor
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FLEUROV VLADIMIR B
description 극자외(extreme ultraviolet) 광원용 시스템은, 타겟 재료와 상호작용하는 조사 증폭 광빔(irradiating amplified light beam)의 적어도 일부분의 반사를 포함하는 반사 증폭 광빔을 수신하고 반사 증폭 광빔을 제1 채널, 제2 채널, 및 제3 채널로 지향시키도록 위치된 하나 이상의 광학 요소와, 제1 채널로부터의 광을 감지하는 제1 센서와, 제2 채널 및 제3 채널로부터의 광을 감지하며, 제1 센서보다 낮은 획득률을 갖는 제2 센서를 포함한다. A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor.
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A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor.</description><language>eng ; kor</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; X-RAY TECHNIQUE</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151123&amp;DB=EPODOC&amp;CC=KR&amp;NR=20150130440A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20151123&amp;DB=EPODOC&amp;CC=KR&amp;NR=20150130440A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FOMENKOV IGOR V</creatorcontrib><creatorcontrib>FLEUROV VLADIMIR B</creatorcontrib><title>BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE</title><description>극자외(extreme ultraviolet) 광원용 시스템은, 타겟 재료와 상호작용하는 조사 증폭 광빔(irradiating amplified light beam)의 적어도 일부분의 반사를 포함하는 반사 증폭 광빔을 수신하고 반사 증폭 광빔을 제1 채널, 제2 채널, 및 제3 채널로 지향시키도록 위치된 하나 이상의 광학 요소와, 제1 채널로부터의 광을 감지하는 제1 센서와, 제2 채널 및 제3 채널로부터의 광을 감지하며, 제1 센서보다 낮은 획득률을 갖는 제2 센서를 포함한다. A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor.</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB1cnX0VQjwD_YM8fT3U3D29wsJ8vdRcPMPUnD0U3CNCAly9XVVCPUJCXIM8_T3cQ1R8PF09whRCPYPDXJ25WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGpgaGxgYmJgaOxsSpAgDksirH</recordid><startdate>20151123</startdate><enddate>20151123</enddate><creator>FOMENKOV IGOR V</creator><creator>FLEUROV VLADIMIR B</creator><scope>EVB</scope></search><sort><creationdate>20151123</creationdate><title>BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE</title><author>FOMENKOV IGOR V ; FLEUROV VLADIMIR B</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20150130440A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2015</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>FOMENKOV IGOR V</creatorcontrib><creatorcontrib>FLEUROV VLADIMIR B</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FOMENKOV IGOR V</au><au>FLEUROV VLADIMIR B</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE</title><date>2015-11-23</date><risdate>2015</risdate><abstract>극자외(extreme ultraviolet) 광원용 시스템은, 타겟 재료와 상호작용하는 조사 증폭 광빔(irradiating amplified light beam)의 적어도 일부분의 반사를 포함하는 반사 증폭 광빔을 수신하고 반사 증폭 광빔을 제1 채널, 제2 채널, 및 제3 채널로 지향시키도록 위치된 하나 이상의 광학 요소와, 제1 채널로부터의 광을 감지하는 제1 센서와, 제2 채널 및 제3 채널로부터의 광을 감지하며, 제1 센서보다 낮은 획득률을 갖는 제2 센서를 포함한다. A system for an extreme ultraviolet light source includes one or more optical elements positioned to receive a reflected amplified light beam and to direct the reflected amplified light beam into first, second, and third channels, the reflected amplified light beam including a reflection of at least a portion of an irradiating amplified light beam that interacts with a target material; a first sensor that senses light from the first channel; a second sensor that senses light from the second channel and the third channel, the second sensor having a lower acquisition rate than the first sensor.</abstract><oa>free_for_read</oa></addata></record>
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title BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
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