ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM

The present invention relates to an adhesive composition which has excellent anti-static performance, excellent adhesion balance on low speed delamination rate and high speed delamination rate and excellent durability and rework performance. The adhesive composition comprises: (A) (meta)acrylic acid...

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Hauptverfasser: ENDO YOSHIKO, HASEGAWA RYO, NAGAKURA TAKESHI, SHIMAGUCHI RYUUSUKE
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Sprache:eng ; kor
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creator ENDO YOSHIKO
HASEGAWA RYO
NAGAKURA TAKESHI
SHIMAGUCHI RYUUSUKE
description The present invention relates to an adhesive composition which has excellent anti-static performance, excellent adhesion balance on low speed delamination rate and high speed delamination rate and excellent durability and rework performance. The adhesive composition comprises: (A) (meta)acrylic acid ester monomer in which the carbon number of an alkyl group is C4~C18; (B) monomers having a hydroxyl group capable of copolymerization; (C) monomers having a carboxyl group capable of copolymerization; (D) polyalkylene glycol mono(meta) acrylic acid ester monomers; (E) acrylic monomers of copolymers including at least one among hydroxyl group-free vinyl monomers containing nitrogen or alkyl(meta)acrylate monomers containing an alkoxy group; (F) trifunctional or higher isocyanate compounds; (G) cross linking retarders; (H) cross linking catalysts; and (I) antistatic agents, wherein an acid value of the acrylic polymer is 0.01-8.0.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20150032770A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20150032770A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20150032770A3</originalsourceid><addsrcrecordid>eNrjZDBwdPFwDfYMc1Vw9vcN8A_2DPH091Nw9HNRCA4NcnN0dlUICPIPcXUGC7t5-vjyMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjA0NTAwNjI3NzA0dj4lQBAM-RJzE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM</title><source>esp@cenet</source><creator>ENDO YOSHIKO ; HASEGAWA RYO ; NAGAKURA TAKESHI ; SHIMAGUCHI RYUUSUKE</creator><creatorcontrib>ENDO YOSHIKO ; HASEGAWA RYO ; NAGAKURA TAKESHI ; SHIMAGUCHI RYUUSUKE</creatorcontrib><description>The present invention relates to an adhesive composition which has excellent anti-static performance, excellent adhesion balance on low speed delamination rate and high speed delamination rate and excellent durability and rework performance. The adhesive composition comprises: (A) (meta)acrylic acid ester monomer in which the carbon number of an alkyl group is C4~C18; (B) monomers having a hydroxyl group capable of copolymerization; (C) monomers having a carboxyl group capable of copolymerization; (D) polyalkylene glycol mono(meta) acrylic acid ester monomers; (E) acrylic monomers of copolymers including at least one among hydroxyl group-free vinyl monomers containing nitrogen or alkyl(meta)acrylate monomers containing an alkoxy group; (F) trifunctional or higher isocyanate compounds; (G) cross linking retarders; (H) cross linking catalysts; and (I) antistatic agents, wherein an acid value of the acrylic polymer is 0.01-8.0.</description><language>eng ; kor</language><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ; ADHESIVES ; CHEMISTRY ; DYES ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ; PAINTS ; POLISHES ; USE OF MATERIALS AS ADHESIVES</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20150330&amp;DB=EPODOC&amp;CC=KR&amp;NR=20150032770A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20150330&amp;DB=EPODOC&amp;CC=KR&amp;NR=20150032770A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ENDO YOSHIKO</creatorcontrib><creatorcontrib>HASEGAWA RYO</creatorcontrib><creatorcontrib>NAGAKURA TAKESHI</creatorcontrib><creatorcontrib>SHIMAGUCHI RYUUSUKE</creatorcontrib><title>ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM</title><description>The present invention relates to an adhesive composition which has excellent anti-static performance, excellent adhesion balance on low speed delamination rate and high speed delamination rate and excellent durability and rework performance. The adhesive composition comprises: (A) (meta)acrylic acid ester monomer in which the carbon number of an alkyl group is C4~C18; (B) monomers having a hydroxyl group capable of copolymerization; (C) monomers having a carboxyl group capable of copolymerization; (D) polyalkylene glycol mono(meta) acrylic acid ester monomers; (E) acrylic monomers of copolymers including at least one among hydroxyl group-free vinyl monomers containing nitrogen or alkyl(meta)acrylate monomers containing an alkoxy group; (F) trifunctional or higher isocyanate compounds; (G) cross linking retarders; (H) cross linking catalysts; and (I) antistatic agents, wherein an acid value of the acrylic polymer is 0.01-8.0.</description><subject>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE</subject><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>USE OF MATERIALS AS ADHESIVES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBwdPFwDfYMc1Vw9vcN8A_2DPH091Nw9HNRCA4NcnN0dlUICPIPcXUGC7t5-vjyMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JJ47yAjA0NTAwNjI3NzA0dj4lQBAM-RJzE</recordid><startdate>20150330</startdate><enddate>20150330</enddate><creator>ENDO YOSHIKO</creator><creator>HASEGAWA RYO</creator><creator>NAGAKURA TAKESHI</creator><creator>SHIMAGUCHI RYUUSUKE</creator><scope>EVB</scope></search><sort><creationdate>20150330</creationdate><title>ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM</title><author>ENDO YOSHIKO ; HASEGAWA RYO ; NAGAKURA TAKESHI ; SHIMAGUCHI RYUUSUKE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20150032770A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2015</creationdate><topic>ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE</topic><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>USE OF MATERIALS AS ADHESIVES</topic><toplevel>online_resources</toplevel><creatorcontrib>ENDO YOSHIKO</creatorcontrib><creatorcontrib>HASEGAWA RYO</creatorcontrib><creatorcontrib>NAGAKURA TAKESHI</creatorcontrib><creatorcontrib>SHIMAGUCHI RYUUSUKE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ENDO YOSHIKO</au><au>HASEGAWA RYO</au><au>NAGAKURA TAKESHI</au><au>SHIMAGUCHI RYUUSUKE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM</title><date>2015-03-30</date><risdate>2015</risdate><abstract>The present invention relates to an adhesive composition which has excellent anti-static performance, excellent adhesion balance on low speed delamination rate and high speed delamination rate and excellent durability and rework performance. The adhesive composition comprises: (A) (meta)acrylic acid ester monomer in which the carbon number of an alkyl group is C4~C18; (B) monomers having a hydroxyl group capable of copolymerization; (C) monomers having a carboxyl group capable of copolymerization; (D) polyalkylene glycol mono(meta) acrylic acid ester monomers; (E) acrylic monomers of copolymers including at least one among hydroxyl group-free vinyl monomers containing nitrogen or alkyl(meta)acrylate monomers containing an alkoxy group; (F) trifunctional or higher isocyanate compounds; (G) cross linking retarders; (H) cross linking catalysts; and (I) antistatic agents, wherein an acid value of the acrylic polymer is 0.01-8.0.</abstract><oa>free_for_read</oa></addata></record>
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subjects ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE
ADHESIVES
CHEMISTRY
DYES
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL
PAINTS
POLISHES
USE OF MATERIALS AS ADHESIVES
title ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM
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