VACUUM CHAMBER WITH PURGE APPARATUS OF HIGH TEMPERATURE AND HIGH PRESSURE INJECTION TYPE AND CLEANING METHOD USING IT

The present invention relates to a vacuum chamber with a purge apparatus of high temperature and high pressure injection type and a cleaning method using the same. More particularly, a purge gas for cleaning the inside of a double chamber having a single chamber and a sub chamber is supplied. A high...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM, GYOUNG HUN, YUN, WON HEE, KANG, BYEUNG CHEUL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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