THIN FILM DEPOSITION APPARATUS

The present invention relates to a thin film depositing apparatus. The thin film depositing apparatus according to the present invention includes a chamber which includes a deposition space inside, a substrate support unit which is formed in the chamber and receives a substrate, a processing gas sup...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIM, WOO PIL, KIM, JAE HWAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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