OXIDE SINTERED BODY AND SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SAME
The Li-containing transition metal oxide sintered compact of the present invention includes Li and a transition metal, and further includes Al, Si, Zr, Ca, and Y as impurity elements, of which contents are controlled to the following ranges: Al ¤ 90 ppm; Si ¤ 100 ppm; Zr ¤ 100 ppm; Ca ¤ 80 ppm;...
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| creator | TAO YUKI KIKUYAMA HIDESHI KANAMARU MORIYOSHI TAKETOMI YUICHI SAKAI KENJI HASEYAMA SHUETSU |
| description | The Li-containing transition metal oxide sintered compact of the present invention includes Li and a transition metal, and further includes Al, Si, Zr, Ca, and Y as impurity elements, of which contents are controlled to the following ranges: Al ¤ 90 ppm; Si ¤ 100 ppm; Zr ¤ 100 ppm; Ca ¤ 80 ppm; and Y ¤ 20 ppm, wherein the sintered compact has a relative density of 95% or higher and a specific resistance of lower than 2 x 10 7 © cm. The present invention makes it possible to stably form Li-containing transition metal oxide thin films useful as the positive electrode thin films of secondary batteries or the like at a high deposition rate without causing abnormal discharge. |
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The present invention makes it possible to stably form Li-containing transition metal oxide thin films useful as the positive electrode thin films of secondary batteries or the like at a high deposition rate without causing abnormal discharge.</description><language>eng ; kor</language><subject>ARTIFICIAL STONE ; CEMENTS ; CERAMICS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS ; CONCRETE ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LIME, MAGNESIA ; METALLURGY ; REFRACTORIES ; SLAG ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TREATMENT OF NATURAL STONE</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141001&DB=EPODOC&CC=KR&NR=20140116182A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20141001&DB=EPODOC&CC=KR&NR=20140116182A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAO YUKI</creatorcontrib><creatorcontrib>KIKUYAMA HIDESHI</creatorcontrib><creatorcontrib>KANAMARU MORIYOSHI</creatorcontrib><creatorcontrib>TAKETOMI YUICHI</creatorcontrib><creatorcontrib>SAKAI KENJI</creatorcontrib><creatorcontrib>HASEYAMA SHUETSU</creatorcontrib><title>OXIDE SINTERED BODY AND SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SAME</title><description>The Li-containing transition metal oxide sintered compact of the present invention includes Li and a transition metal, and further includes Al, Si, Zr, Ca, and Y as impurity elements, of which contents are controlled to the following ranges: Al ¤ 90 ppm; Si ¤ 100 ppm; Zr ¤ 100 ppm; Ca ¤ 80 ppm; and Y ¤ 20 ppm, wherein the sintered compact has a relative density of 95% or higher and a specific resistance of lower than 2 x 10 7 © cm. The present invention makes it possible to stably form Li-containing transition metal oxide thin films useful as the positive electrode thin films of secondary batteries or the like at a high deposition rate without causing abnormal discharge.</description><subject>ARTIFICIAL STONE</subject><subject>CEMENTS</subject><subject>CERAMICS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</subject><subject>CONCRETE</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LIME, MAGNESIA</subject><subject>METALLURGY</subject><subject>REFRACTORIES</subject><subject>SLAG</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TREATMENT OF NATURAL STONE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPDxj_B0cVUI9vQLcQ1ydVFw8neJVHD0c1EIDggNAQp5-rkrhDgGubuG6ICFfV1DPPxdFNz8gxR8Hf1C3RydQ0LBioIdfV15GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakm8d5CRgaGJgaGhmaGFkaMxcaoAW7sumA</recordid><startdate>20141001</startdate><enddate>20141001</enddate><creator>TAO YUKI</creator><creator>KIKUYAMA HIDESHI</creator><creator>KANAMARU MORIYOSHI</creator><creator>TAKETOMI YUICHI</creator><creator>SAKAI KENJI</creator><creator>HASEYAMA SHUETSU</creator><scope>EVB</scope></search><sort><creationdate>20141001</creationdate><title>OXIDE SINTERED BODY AND SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SAME</title><author>TAO YUKI ; KIKUYAMA HIDESHI ; KANAMARU MORIYOSHI ; TAKETOMI YUICHI ; SAKAI KENJI ; HASEYAMA SHUETSU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20140116182A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2014</creationdate><topic>ARTIFICIAL STONE</topic><topic>CEMENTS</topic><topic>CERAMICS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</topic><topic>CONCRETE</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LIME, MAGNESIA</topic><topic>METALLURGY</topic><topic>REFRACTORIES</topic><topic>SLAG</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TREATMENT OF NATURAL STONE</topic><toplevel>online_resources</toplevel><creatorcontrib>TAO YUKI</creatorcontrib><creatorcontrib>KIKUYAMA HIDESHI</creatorcontrib><creatorcontrib>KANAMARU MORIYOSHI</creatorcontrib><creatorcontrib>TAKETOMI YUICHI</creatorcontrib><creatorcontrib>SAKAI KENJI</creatorcontrib><creatorcontrib>HASEYAMA SHUETSU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TAO YUKI</au><au>KIKUYAMA HIDESHI</au><au>KANAMARU MORIYOSHI</au><au>TAKETOMI YUICHI</au><au>SAKAI KENJI</au><au>HASEYAMA SHUETSU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>OXIDE SINTERED BODY AND SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SAME</title><date>2014-10-01</date><risdate>2014</risdate><abstract>The Li-containing transition metal oxide sintered compact of the present invention includes Li and a transition metal, and further includes Al, Si, Zr, Ca, and Y as impurity elements, of which contents are controlled to the following ranges: Al ¤ 90 ppm; Si ¤ 100 ppm; Zr ¤ 100 ppm; Ca ¤ 80 ppm; and Y ¤ 20 ppm, wherein the sintered compact has a relative density of 95% or higher and a specific resistance of lower than 2 x 10 7 © cm. The present invention makes it possible to stably form Li-containing transition metal oxide thin films useful as the positive electrode thin films of secondary batteries or the like at a high deposition rate without causing abnormal discharge.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE |
| title | OXIDE SINTERED BODY AND SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SAME |
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