REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELENGTH RANGE, METHOD FOR PRODUCING AND FOR CORRECTING SUCH AN ELEMENT, PROJECTION LENS FOR MICROLITHOGRAPHY COMPRISING SUCH AN ELEMENT, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION LENS

A reflective optical element 39 for EUV wavelengths having a layer arrangement on the surface of a substrate, wherein the layer arrangement includes at least one layer subsystem 37 consisting of a periodic sequence of at least one period of individual layers. The period includes two individual layer...

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Bibliographische Detailangaben
Hauptverfasser:	SCHLICHENMAIER CHRISTOPH, CLAUSS WILFRIED, KERWIEN NORBERT, WEISER MARTIN, BITTNER BORIS, WABRA NORBERT, WEISS MARKUS
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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