METHOD FOR DEPOSITING ZNO TRANSPARENT ELECTRODE

The present invention provides a method for depositing a zinc oxide (ZnO) transparent electrode, including a step of preparing a polymer based base plate and a ZnO target doped with gallium (Ga) or aluminum (Al); and a step of depositing a ZnO transparent electrode through sputtering using the ZnO t...

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Bibliographische Detailangaben
Hauptverfasser:	KOH, SEOK HOON, SEO, BEOM SIK, PARK, BYUNG CHANG, YUN, YOUNG SUN, KIM, HEE YOUNG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CALCULATING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPUTING COUNTING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DIGITAL DATA PROCESSING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention provides a method for depositing a zinc oxide (ZnO) transparent electrode, including a step of preparing a polymer based base plate and a ZnO target doped with gallium (Ga) or aluminum (Al); and a step of depositing a ZnO transparent electrode through sputtering using the ZnO target. The present invention can deposit the ZnO transparent electrode having lower resistivity and high transmittance, which can replace an indium tin oxide (ITO) transparent electrode by depositing the ZnO target on the ZnO transparent electrode through sputtering by adjusting various conditions applied to it.