TEXTURING OF MONOCRYSTALLINE SEMICONDUCTOR SUBSTRATES TO REDUCE INCIDENT LIGHT REFLECTANCE

Because a monocrystalline semiconductor substrate is textured by using an alkali solution and a pyramid structure is formed on its surface, the reflectivity of incident light is reduced and the light absorption of a wafer is improved. An alkaline bath includes a composition for preventing an uneven...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: O'CONNOR COREY, HINKLEY PETER W, BARR ROBERT K, ALLARDYCE GEORGE R
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Because a monocrystalline semiconductor substrate is textured by using an alkali solution and a pyramid structure is formed on its surface, the reflectivity of incident light is reduced and the light absorption of a wafer is improved. An alkaline bath includes a composition for preventing an uneven region from being formed between the pyramid structures and improving the light absorption.