CONFINED PROCESS VOLUME PECVD CHAMBER

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Hauptverfasser: NOWAK THOMAS, ROCHA ALVAREZ JUAN CARLOS, DU BOIS DALE R, REILLY PATRICK, SANKARAKRISHNAN RAMPRAKASH, BALASUBRAMANIAN GANESH, FODOR MARK A, BANSAL AMIT, AYOUB MOHAMAD, PADHI DEENESH, ZHOU JIANHUA, SHAIKH SHAHID
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creator NOWAK THOMAS
ROCHA ALVAREZ JUAN CARLOS
DU BOIS DALE R
REILLY PATRICK
SANKARAKRISHNAN RAMPRAKASH
BALASUBRAMANIAN GANESH
FODOR MARK A
BANSAL AMIT
AYOUB MOHAMAD
PADHI DEENESH
ZHOU JIANHUA
SHAIKH SHAHID
description
format Patent
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language eng ; kor
recordid cdi_epo_espacenet_KR20130111221A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title CONFINED PROCESS VOLUME PECVD CHAMBER
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