LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY
PURPOSE: A lens heating awareness source mask optimization for advanced next generation lithography is provided to provide a tool which optimizes a lighting source and mask design layouts used in a lithography apparatus and a process thereof. CONSTITUTION: According to a computer-implementation meth...
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| creator | VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA HUANG WENJIN LIU HUA YU LIU PENG JIANG AIQIN CROUSE MICHAEL MATTHEW |
| description | PURPOSE: A lens heating awareness source mask optimization for advanced next generation lithography is provided to provide a tool which optimizes a lighting source and mask design layouts used in a lithography apparatus and a process thereof. CONSTITUTION: According to a computer-implementation method, a lithography process is improved which images a part of a design layout on a substrate by using a lithography projection apparatus including a lighting source and a projection optical device. A multi-variable cost function of a plurality of design variables which are characteristics of a lithography process is computed. The characteristics of the lithography process are reconfigured, by adjusting the design variables until a predetermined ending condition is satisfied. At least a part of the design variables are the characteristics of the lighting source and the design layout. Computation of the multi-variable cost function explains the influence for the optical characteristics of the induced projection optical device by imaging a part of the design layout with the lighting source through the projection optical device. [Reference numerals] (405) Acquire the characteristics of design variables of a lighting source, a mask design layout, and a projection optical device; (410) Determine optical aberrations induced by heating a lens using the design variables; (415) Define a projection optical device model including the determined optical aberrations; (420) Perform SMO using the projection optical model including the optical variables induced by heating the lens; (425) Output results |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20130092485A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20130092485A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20130092485A3</originalsourceid><addsrcrecordid>eNrjZHDxcfULVvBwdQzx9HNXcAx3DHJVCPYPDXJ2VfB1DPZW8A8I8fT1jAJK-_spuPkHKTi6hDn6Obu6KPh4hnj4uwc5BnhE8jCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSSeO8gIwNDYwMDSyMTC1NHY-JUAQALRSy5</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY</title><source>esp@cenet</source><creator>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ; HUANG WENJIN ; LIU HUA YU ; LIU PENG ; JIANG AIQIN ; CROUSE MICHAEL MATTHEW</creator><creatorcontrib>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ; HUANG WENJIN ; LIU HUA YU ; LIU PENG ; JIANG AIQIN ; CROUSE MICHAEL MATTHEW</creatorcontrib><description>PURPOSE: A lens heating awareness source mask optimization for advanced next generation lithography is provided to provide a tool which optimizes a lighting source and mask design layouts used in a lithography apparatus and a process thereof. CONSTITUTION: According to a computer-implementation method, a lithography process is improved which images a part of a design layout on a substrate by using a lithography projection apparatus including a lighting source and a projection optical device. A multi-variable cost function of a plurality of design variables which are characteristics of a lithography process is computed. The characteristics of the lithography process are reconfigured, by adjusting the design variables until a predetermined ending condition is satisfied. At least a part of the design variables are the characteristics of the lighting source and the design layout. Computation of the multi-variable cost function explains the influence for the optical characteristics of the induced projection optical device by imaging a part of the design layout with the lighting source through the projection optical device. [Reference numerals] (405) Acquire the characteristics of design variables of a lighting source, a mask design layout, and a projection optical device; (410) Determine optical aberrations induced by heating a lens using the design variables; (415) Define a projection optical device model including the determined optical aberrations; (420) Perform SMO using the projection optical model including the optical variables induced by heating the lens; (425) Output results</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130820&DB=EPODOC&CC=KR&NR=20130092485A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130820&DB=EPODOC&CC=KR&NR=20130092485A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA</creatorcontrib><creatorcontrib>HUANG WENJIN</creatorcontrib><creatorcontrib>LIU HUA YU</creatorcontrib><creatorcontrib>LIU PENG</creatorcontrib><creatorcontrib>JIANG AIQIN</creatorcontrib><creatorcontrib>CROUSE MICHAEL MATTHEW</creatorcontrib><title>LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY</title><description>PURPOSE: A lens heating awareness source mask optimization for advanced next generation lithography is provided to provide a tool which optimizes a lighting source and mask design layouts used in a lithography apparatus and a process thereof. CONSTITUTION: According to a computer-implementation method, a lithography process is improved which images a part of a design layout on a substrate by using a lithography projection apparatus including a lighting source and a projection optical device. A multi-variable cost function of a plurality of design variables which are characteristics of a lithography process is computed. The characteristics of the lithography process are reconfigured, by adjusting the design variables until a predetermined ending condition is satisfied. At least a part of the design variables are the characteristics of the lighting source and the design layout. Computation of the multi-variable cost function explains the influence for the optical characteristics of the induced projection optical device by imaging a part of the design layout with the lighting source through the projection optical device. [Reference numerals] (405) Acquire the characteristics of design variables of a lighting source, a mask design layout, and a projection optical device; (410) Determine optical aberrations induced by heating a lens using the design variables; (415) Define a projection optical device model including the determined optical aberrations; (420) Perform SMO using the projection optical model including the optical variables induced by heating the lens; (425) Output results</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDxcfULVvBwdQzx9HNXcAx3DHJVCPYPDXJ2VfB1DPZW8A8I8fT1jAJK-_spuPkHKTi6hDn6Obu6KPh4hnj4uwc5BnhE8jCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSSeO8gIwNDYwMDSyMTC1NHY-JUAQALRSy5</recordid><startdate>20130820</startdate><enddate>20130820</enddate><creator>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA</creator><creator>HUANG WENJIN</creator><creator>LIU HUA YU</creator><creator>LIU PENG</creator><creator>JIANG AIQIN</creator><creator>CROUSE MICHAEL MATTHEW</creator><scope>EVB</scope></search><sort><creationdate>20130820</creationdate><title>LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY</title><author>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ; HUANG WENJIN ; LIU HUA YU ; LIU PENG ; JIANG AIQIN ; CROUSE MICHAEL MATTHEW</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20130092485A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2013</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA</creatorcontrib><creatorcontrib>HUANG WENJIN</creatorcontrib><creatorcontrib>LIU HUA YU</creatorcontrib><creatorcontrib>LIU PENG</creatorcontrib><creatorcontrib>JIANG AIQIN</creatorcontrib><creatorcontrib>CROUSE MICHAEL MATTHEW</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA</au><au>HUANG WENJIN</au><au>LIU HUA YU</au><au>LIU PENG</au><au>JIANG AIQIN</au><au>CROUSE MICHAEL MATTHEW</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY</title><date>2013-08-20</date><risdate>2013</risdate><abstract>PURPOSE: A lens heating awareness source mask optimization for advanced next generation lithography is provided to provide a tool which optimizes a lighting source and mask design layouts used in a lithography apparatus and a process thereof. CONSTITUTION: According to a computer-implementation method, a lithography process is improved which images a part of a design layout on a substrate by using a lithography projection apparatus including a lighting source and a projection optical device. A multi-variable cost function of a plurality of design variables which are characteristics of a lithography process is computed. The characteristics of the lithography process are reconfigured, by adjusting the design variables until a predetermined ending condition is satisfied. At least a part of the design variables are the characteristics of the lighting source and the design layout. Computation of the multi-variable cost function explains the influence for the optical characteristics of the induced projection optical device by imaging a part of the design layout with the lighting source through the projection optical device. [Reference numerals] (405) Acquire the characteristics of design variables of a lighting source, a mask design layout, and a projection optical device; (410) Determine optical aberrations induced by heating a lens using the design variables; (415) Define a projection optical device model including the determined optical aberrations; (420) Perform SMO using the projection optical model including the optical variables induced by heating the lens; (425) Output results</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY |
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