METHOD OF MANUFACTURING A MAGNETIC MEMORY DEVICE

METHOD OF MANUFACTURING A MAGNETIC MEMORY DEVICE

PURPOSE: A method for manufacturing a magnetic memory device is provided to prevent the generation of an electrical short circuit due to the redeposition of etch residues on an upper magnetic pattern and a lower magnetic pattern wall. CONSTITUTION: A lower magnetic layer and an insulating layer are...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BAEK, JAE JIK, YOON, BO UN, HAN, JEONG NAM, AHN, KEVIN, CHA, JI HOON
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PURPOSE: A method for manufacturing a magnetic memory device is provided to prevent the generation of an electrical short circuit due to the redeposition of etch residues on an upper magnetic pattern and a lower magnetic pattern wall. CONSTITUTION: A lower magnetic layer and an insulating layer are successively formed on a substrate(100). An upper magnetic pattern(145) is formed on the insulating layer. A main sacrificial layer(190) is formed on the sidewall of the upper magnetic pattern. The insulating layer and the lower magnetic layer are patterned to form an insulating pattern(135) and a lower part magnetic pattern(125). The main sacrificial layer is removed.