SYSTEM FOR CONTROLLING IN PARALLEL VACUUM EQUIPMENT

PURPOSE: A vacuum facility control system for controlling vacuum devices parallely is provided to reduce the time for a secondary refining process by quickly reducing the degree of vacuum in a vessel. CONSTITUTION: A vacuum facility control system comprises a plurality of vacuum devices(200), a cont...

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Bibliographische Detailangaben
Hauptverfasser: KIM, BYUNG IL, KIM, SEUNG BAE, YOO, CHANG KEUN, LEE, EUN SIN
Format: Patent
Sprache:eng ; kor
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