SYSTEM FOR CONTROLLING IN PARALLEL VACUUM EQUIPMENT

PURPOSE: A vacuum facility control system for controlling vacuum devices parallely is provided to reduce the time for a secondary refining process by quickly reducing the degree of vacuum in a vessel. CONSTITUTION: A vacuum facility control system comprises a plurality of vacuum devices(200), a cont...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, BYUNG IL, KIM, SEUNG BAE, YOO, CHANG KEUN, LEE, EUN SIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMISTRY FERROUS OR NON-FERROUS ALLOYS MANUFACTURE OF IRON OR STEEL METALLURGY METALLURGY OF IRON PRETREATMENT OF RAW MATERIALS PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OFWROUGHT-IRON OR STEEL PRODUCTION AND REFINING OF METALS TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	PURPOSE: A vacuum facility control system for controlling vacuum devices parallely is provided to reduce the time for a secondary refining process by quickly reducing the degree of vacuum in a vessel. CONSTITUTION: A vacuum facility control system comprises a plurality of vacuum devices(200), a control unit(300), and a measuring instrument(110). The plurality of vacuum devices evacuates a vessel(100) through a vent. The measuring instrument measures the internal vacuum degree of the vessel. The control unit controls the plurality of vacuum devices parallely by setting the number of the vacuum devices to be operated according to reference vacuum ranges. If the vacuum degree of the vessel measured by the measuring instrument is included in one of the reference vacuum ranges, the control unit parallely operates a corresponding number of the vacuum devices for the reference vacuum range.