SHOWERHEAD CONFIGURATIONS FOR PLASMA REACTORS

PURPOSE: Showerhead configuration for plasma reactors is provided to increase the ion energy of plasma without increasing the size of a shower head and/or a processing chamber by increasing a surface area of a shower head. CONSTITUTION: A downstream plasma apparatus(100) includes a downstream plasma...

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Bibliographische Detailangaben
Hauptverfasser:	ANGELOV IVELIN A, CARON JAMES E, KALINOVSKI ILIA, LI ZHAO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: Showerhead configuration for plasma reactors is provided to increase the ion energy of plasma without increasing the size of a shower head and/or a processing chamber by increasing a surface area of a shower head. CONSTITUTION: A downstream plasma apparatus(100) includes a downstream plasma source chamber(102) and an exposure chamber(104) separated by a shower head assembly(106). The shower head assembly includes a shower head(108). A wafer(112) is placed on a top portion of a platen, a stage, or a workpiece supporting unit(114) inside the exposure chamber. The surface of the shower head contacting the platen is separated from a wafer surface on an upper portion of the platen about 0.5-2 inch.