PHOTORESIST COMPOSITION
PURPOSE: A photoresist composition, a flat panel display device using the same, a semiconductor device are provided to improve residual film rate and to prevent the reduction of sensitivity although h-line light source is used. CONSTITUTION: A photoresist composition includes 10-25 weight% of alkali...
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| creator | KIM, SEONG HYEON SUNG, SHI JIN JIN, SUNG YEOL |
| description | PURPOSE: A photoresist composition, a flat panel display device using the same, a semiconductor device are provided to improve residual film rate and to prevent the reduction of sensitivity although h-line light source is used. CONSTITUTION: A photoresist composition includes 10-25 weight% of alkali soluble resin, 0.1-5 weight% of oxime urethane-based photobase generator, 1-10 weight% of photosensitive compound, and remaining amount of solvent. The oxime urethane-based photobase generator is selected from compounds displayed chemical formulas 1 to 4. The photosensitive compound is quinonediazide compound. The solvent is one or more selected from a group including glycol ether ester, glycol ether, ester, ketone, and cyclic ester. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20120040985A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20120040985A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20120040985A3</originalsourceid><addsrcrecordid>eNrjZBAP8PAP8Q9yDfYMDlFw9vcN8A_2DPH09-NhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGhkYGBiYGlhamjsbEqQIAexggsA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTORESIST COMPOSITION</title><source>esp@cenet</source><creator>KIM, SEONG HYEON ; SUNG, SHI JIN ; JIN, SUNG YEOL</creator><creatorcontrib>KIM, SEONG HYEON ; SUNG, SHI JIN ; JIN, SUNG YEOL</creatorcontrib><description>PURPOSE: A photoresist composition, a flat panel display device using the same, a semiconductor device are provided to improve residual film rate and to prevent the reduction of sensitivity although h-line light source is used. CONSTITUTION: A photoresist composition includes 10-25 weight% of alkali soluble resin, 0.1-5 weight% of oxime urethane-based photobase generator, 1-10 weight% of photosensitive compound, and remaining amount of solvent. The oxime urethane-based photobase generator is selected from compounds displayed chemical formulas 1 to 4. The photosensitive compound is quinonediazide compound. The solvent is one or more selected from a group including glycol ether ester, glycol ether, ester, ketone, and cyclic ester.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120430&DB=EPODOC&CC=KR&NR=20120040985A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120430&DB=EPODOC&CC=KR&NR=20120040985A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM, SEONG HYEON</creatorcontrib><creatorcontrib>SUNG, SHI JIN</creatorcontrib><creatorcontrib>JIN, SUNG YEOL</creatorcontrib><title>PHOTORESIST COMPOSITION</title><description>PURPOSE: A photoresist composition, a flat panel display device using the same, a semiconductor device are provided to improve residual film rate and to prevent the reduction of sensitivity although h-line light source is used. CONSTITUTION: A photoresist composition includes 10-25 weight% of alkali soluble resin, 0.1-5 weight% of oxime urethane-based photobase generator, 1-10 weight% of photosensitive compound, and remaining amount of solvent. The oxime urethane-based photobase generator is selected from compounds displayed chemical formulas 1 to 4. The photosensitive compound is quinonediazide compound. The solvent is one or more selected from a group including glycol ether ester, glycol ether, ester, ketone, and cyclic ester.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAP8PAP8Q9yDfYMDlFw9vcN8A_2DPH09-NhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGhkYGBiYGlhamjsbEqQIAexggsA</recordid><startdate>20120430</startdate><enddate>20120430</enddate><creator>KIM, SEONG HYEON</creator><creator>SUNG, SHI JIN</creator><creator>JIN, SUNG YEOL</creator><scope>EVB</scope></search><sort><creationdate>20120430</creationdate><title>PHOTORESIST COMPOSITION</title><author>KIM, SEONG HYEON ; SUNG, SHI JIN ; JIN, SUNG YEOL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20120040985A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2012</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM, SEONG HYEON</creatorcontrib><creatorcontrib>SUNG, SHI JIN</creatorcontrib><creatorcontrib>JIN, SUNG YEOL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM, SEONG HYEON</au><au>SUNG, SHI JIN</au><au>JIN, SUNG YEOL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTORESIST COMPOSITION</title><date>2012-04-30</date><risdate>2012</risdate><abstract>PURPOSE: A photoresist composition, a flat panel display device using the same, a semiconductor device are provided to improve residual film rate and to prevent the reduction of sensitivity although h-line light source is used. CONSTITUTION: A photoresist composition includes 10-25 weight% of alkali soluble resin, 0.1-5 weight% of oxime urethane-based photobase generator, 1-10 weight% of photosensitive compound, and remaining amount of solvent. The oxime urethane-based photobase generator is selected from compounds displayed chemical formulas 1 to 4. The photosensitive compound is quinonediazide compound. The solvent is one or more selected from a group including glycol ether ester, glycol ether, ester, ketone, and cyclic ester.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | PHOTORESIST COMPOSITION |
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