OPTICAL ELEMENT FOR INFRARED OPTICAL SYSTEM HAVING ANTI-REFLECTION STRUCTURE COMPOSED OF DIFFERENT MATERIAL AND METHOD OF FABRICATING THE SAME

PURPOSE: An optical device for an infrared optical system with a microstructure which is preventing reflection of different materials and a manufacturing method thereof are provided to improve productivity, thereby reducing manufacturing costs. CONSTITUTION: A first material is included at least a s...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	KANG, SHIN ILL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	COLORIMETRY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS RADIATION PYROMETRY TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	KANG, SHIN ILL
description	PURPOSE: An optical device for an infrared optical system with a microstructure which is preventing reflection of different materials and a manufacturing method thereof are provided to improve productivity, thereby reducing manufacturing costs. CONSTITUTION: A first material is included at least a surface of an optical device(10) of an infrared optical system . A microstructure(23) which is preventing reflection of different materials has anisotropic etching property and infrared penetrability . The microstructure is formed on a surface of the optical device with a refractive index of a second material which is larger than air and smaller the first material.
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20110088030A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20110088030A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20110088030A3</originalsourceid><addsrcrecordid>eNqNzDELwjAQBeAuDqL-hwNnIbVL1zO92GCTlMtVcBKROIkK9Xf4m21Fd6c3vPe-afYKrViNDVBDjryACQzWG0amCn5lPEQhBzXurd8CerErJtOQFhs8ROFOS8cEOrg2xPFooLLGEI-kQyG2A4O-AkdSh8_A4IYHXUZSaoKIjubZ5HK69mnxzVm2NCS6XqXH_Zj6x-mcbul53PFa5blSZakKhcV_qzfQ3kCp</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>OPTICAL ELEMENT FOR INFRARED OPTICAL SYSTEM HAVING ANTI-REFLECTION STRUCTURE COMPOSED OF DIFFERENT MATERIAL AND METHOD OF FABRICATING THE SAME</title><source>esp@cenet</source><creator>KANG, SHIN ILL</creator><creatorcontrib>KANG, SHIN ILL</creatorcontrib><description>PURPOSE: An optical device for an infrared optical system with a microstructure which is preventing reflection of different materials and a manufacturing method thereof are provided to improve productivity, thereby reducing manufacturing costs. CONSTITUTION: A first material is included at least a surface of an optical device(10) of an infrared optical system . A microstructure(23) which is preventing reflection of different materials has anisotropic etching property and infrared penetrability . The microstructure is formed on a surface of the optical device with a refractive index of a second material which is larger than air and smaller the first material.</description><language>eng ; kor</language><subject>COLORIMETRY ; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT ; MEASURING ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS ; RADIATION PYROMETRY ; TESTING</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110803&DB=EPODOC&CC=KR&NR=20110088030A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110803&DB=EPODOC&CC=KR&NR=20110088030A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KANG, SHIN ILL</creatorcontrib><title>OPTICAL ELEMENT FOR INFRARED OPTICAL SYSTEM HAVING ANTI-REFLECTION STRUCTURE COMPOSED OF DIFFERENT MATERIAL AND METHOD OF FABRICATING THE SAME</title><description>PURPOSE: An optical device for an infrared optical system with a microstructure which is preventing reflection of different materials and a manufacturing method thereof are provided to improve productivity, thereby reducing manufacturing costs. CONSTITUTION: A first material is included at least a surface of an optical device(10) of an infrared optical system . A microstructure(23) which is preventing reflection of different materials has anisotropic etching property and infrared penetrability . The microstructure is formed on a surface of the optical device with a refractive index of a second material which is larger than air and smaller the first material.</description><subject>COLORIMETRY</subject><subject>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</subject><subject>MEASURING</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><subject>RADIATION PYROMETRY</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzDELwjAQBeAuDqL-hwNnIbVL1zO92GCTlMtVcBKROIkK9Xf4m21Fd6c3vPe-afYKrViNDVBDjryACQzWG0amCn5lPEQhBzXurd8CerErJtOQFhs8ROFOS8cEOrg2xPFooLLGEI-kQyG2A4O-AkdSh8_A4IYHXUZSaoKIjubZ5HK69mnxzVm2NCS6XqXH_Zj6x-mcbul53PFa5blSZakKhcV_qzfQ3kCp</recordid><startdate>20110803</startdate><enddate>20110803</enddate><creator>KANG, SHIN ILL</creator><scope>EVB</scope></search><sort><creationdate>20110803</creationdate><title>OPTICAL ELEMENT FOR INFRARED OPTICAL SYSTEM HAVING ANTI-REFLECTION STRUCTURE COMPOSED OF DIFFERENT MATERIAL AND METHOD OF FABRICATING THE SAME</title><author>KANG, SHIN ILL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20110088030A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2011</creationdate><topic>COLORIMETRY</topic><topic>MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT</topic><topic>MEASURING</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><topic>RADIATION PYROMETRY</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>KANG, SHIN ILL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KANG, SHIN ILL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>OPTICAL ELEMENT FOR INFRARED OPTICAL SYSTEM HAVING ANTI-REFLECTION STRUCTURE COMPOSED OF DIFFERENT MATERIAL AND METHOD OF FABRICATING THE SAME</title><date>2011-08-03</date><risdate>2011</risdate><abstract>PURPOSE: An optical device for an infrared optical system with a microstructure which is preventing reflection of different materials and a manufacturing method thereof are provided to improve productivity, thereby reducing manufacturing costs. CONSTITUTION: A first material is included at least a surface of an optical device(10) of an infrared optical system . A microstructure(23) which is preventing reflection of different materials has anisotropic etching property and infrared penetrability . The microstructure is formed on a surface of the optical device with a refractive index of a second material which is larger than air and smaller the first material.</abstract><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	eng ; kor
recordid	cdi_epo_espacenet_KR20110088030A
source	esp@cenet
subjects	COLORIMETRY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS RADIATION PYROMETRY TESTING
title	OPTICAL ELEMENT FOR INFRARED OPTICAL SYSTEM HAVING ANTI-REFLECTION STRUCTURE COMPOSED OF DIFFERENT MATERIAL AND METHOD OF FABRICATING THE SAME
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T17%3A18%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KANG,%20SHIN%20ILL&rft.date=2011-08-03&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20110088030A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true