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A substrate processing tool including a frame forming at least one isolatable chamber configured to hold a controlled atmosphere, at least two substrate supports located within each of the at least one isolatable chamber, each of the at least two substrate supports being stacked one above the other...

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Bibliographische Detailangaben
Hauptverfasser: KRAUS JOSEPH A, CARBONE CRAIG J, BLAHNIK JEFFREY C, HALLISEY JOSEPH, ELLIOT MARTIN R, FONG HI YIN OWEN, HOFMEISTER CHRISTOPHER, KRUPYSHEV ALEXANDER, FOSNIGHT WILLIAM
Format: Patent
Sprache:eng
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