PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND IMAGE SENSOR COLOR FILTER USING THE SAME

A photosensitive resin composition for a color filter and an image sensor color filter using the same are provided to form micro patterns with excellent sensitivity due to a thiol group-containing sensitizer, and to prevent the lower side from being lifted and separated due to a modified compound of...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CHANG, MYUNG HWAN, HAN, GYU SEOK, RYU, JEE HYUN, BYON, NOH SEOK, LEE, CHEON SEOK
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator CHANG, MYUNG HWAN
HAN, GYU SEOK
RYU, JEE HYUN
BYON, NOH SEOK
LEE, CHEON SEOK
description A photosensitive resin composition for a color filter and an image sensor color filter using the same are provided to form micro patterns with excellent sensitivity due to a thiol group-containing sensitizer, and to prevent the lower side from being lifted and separated due to a modified compound of glycerol triacrylate. A photosensitive resin composition comprises a carboxyl group-containing acrylic binder resin, a photopolymerizable monomer, a photopolymerizable initiator, and a thiol group-containing sensitizer represented by chemical formula 1; a modified compound of glycerol triacrylate; organic pigment; and solvent. In chemical formula 1, n is an integer of 2 ~ 6; n1 is 0 ~ 5; R is an organic group; R1 and R2 are identical or is selected from the group consisting of hydrogen and substituted or unsubstituted alkyl group.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20090057814A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20090057814A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20090057814A3</originalsourceid><addsrcrecordid>eNrjZIgL8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspuPkHAfk-QNLN0yfENUjB0c9FwdPX0d1VAaQNXTYUqN9dIcQDKOvo68rDwJqWmFOcyguluRmU3VxDnD10Uwvy41OLCxKTU_NSS-K9g4wMDCwNDEzNLQxNHI2JUwUAFQgz8A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND IMAGE SENSOR COLOR FILTER USING THE SAME</title><source>esp@cenet</source><creator>CHANG, MYUNG HWAN ; HAN, GYU SEOK ; RYU, JEE HYUN ; BYON, NOH SEOK ; LEE, CHEON SEOK</creator><creatorcontrib>CHANG, MYUNG HWAN ; HAN, GYU SEOK ; RYU, JEE HYUN ; BYON, NOH SEOK ; LEE, CHEON SEOK</creatorcontrib><description>A photosensitive resin composition for a color filter and an image sensor color filter using the same are provided to form micro patterns with excellent sensitivity due to a thiol group-containing sensitizer, and to prevent the lower side from being lifted and separated due to a modified compound of glycerol triacrylate. A photosensitive resin composition comprises a carboxyl group-containing acrylic binder resin, a photopolymerizable monomer, a photopolymerizable initiator, and a thiol group-containing sensitizer represented by chemical formula 1; a modified compound of glycerol triacrylate; organic pigment; and solvent. In chemical formula 1, n is an integer of 2 ~ 6; n1 is 0 ~ 5; R is an organic group; R1 and R2 are identical or is selected from the group consisting of hydrogen and substituted or unsubstituted alkyl group.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090608&amp;DB=EPODOC&amp;CC=KR&amp;NR=20090057814A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090608&amp;DB=EPODOC&amp;CC=KR&amp;NR=20090057814A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHANG, MYUNG HWAN</creatorcontrib><creatorcontrib>HAN, GYU SEOK</creatorcontrib><creatorcontrib>RYU, JEE HYUN</creatorcontrib><creatorcontrib>BYON, NOH SEOK</creatorcontrib><creatorcontrib>LEE, CHEON SEOK</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND IMAGE SENSOR COLOR FILTER USING THE SAME</title><description>A photosensitive resin composition for a color filter and an image sensor color filter using the same are provided to form micro patterns with excellent sensitivity due to a thiol group-containing sensitizer, and to prevent the lower side from being lifted and separated due to a modified compound of glycerol triacrylate. A photosensitive resin composition comprises a carboxyl group-containing acrylic binder resin, a photopolymerizable monomer, a photopolymerizable initiator, and a thiol group-containing sensitizer represented by chemical formula 1; a modified compound of glycerol triacrylate; organic pigment; and solvent. In chemical formula 1, n is an integer of 2 ~ 6; n1 is 0 ~ 5; R is an organic group; R1 and R2 are identical or is selected from the group consisting of hydrogen and substituted or unsubstituted alkyl group.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgL8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PspuPkHAfk-QNLN0yfENUjB0c9FwdPX0d1VAaQNXTYUqN9dIcQDKOvo68rDwJqWmFOcyguluRmU3VxDnD10Uwvy41OLCxKTU_NSS-K9g4wMDCwNDEzNLQxNHI2JUwUAFQgz8A</recordid><startdate>20090608</startdate><enddate>20090608</enddate><creator>CHANG, MYUNG HWAN</creator><creator>HAN, GYU SEOK</creator><creator>RYU, JEE HYUN</creator><creator>BYON, NOH SEOK</creator><creator>LEE, CHEON SEOK</creator><scope>EVB</scope></search><sort><creationdate>20090608</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND IMAGE SENSOR COLOR FILTER USING THE SAME</title><author>CHANG, MYUNG HWAN ; HAN, GYU SEOK ; RYU, JEE HYUN ; BYON, NOH SEOK ; LEE, CHEON SEOK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20090057814A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHANG, MYUNG HWAN</creatorcontrib><creatorcontrib>HAN, GYU SEOK</creatorcontrib><creatorcontrib>RYU, JEE HYUN</creatorcontrib><creatorcontrib>BYON, NOH SEOK</creatorcontrib><creatorcontrib>LEE, CHEON SEOK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHANG, MYUNG HWAN</au><au>HAN, GYU SEOK</au><au>RYU, JEE HYUN</au><au>BYON, NOH SEOK</au><au>LEE, CHEON SEOK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND IMAGE SENSOR COLOR FILTER USING THE SAME</title><date>2009-06-08</date><risdate>2009</risdate><abstract>A photosensitive resin composition for a color filter and an image sensor color filter using the same are provided to form micro patterns with excellent sensitivity due to a thiol group-containing sensitizer, and to prevent the lower side from being lifted and separated due to a modified compound of glycerol triacrylate. A photosensitive resin composition comprises a carboxyl group-containing acrylic binder resin, a photopolymerizable monomer, a photopolymerizable initiator, and a thiol group-containing sensitizer represented by chemical formula 1; a modified compound of glycerol triacrylate; organic pigment; and solvent. In chemical formula 1, n is an integer of 2 ~ 6; n1 is 0 ~ 5; R is an organic group; R1 and R2 are identical or is selected from the group consisting of hydrogen and substituted or unsubstituted alkyl group.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_KR20090057814A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND IMAGE SENSOR COLOR FILTER USING THE SAME
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T02%3A35%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHANG,%20MYUNG%20HWAN&rft.date=2009-06-08&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20090057814A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true