EXPOSING METHOD, EXPOSING DEVICE, AND DEVICE MANUFACTURING METHOD

Provided is an exposing method for transferring a first pattern to be formed in a first pattern forming region and a second pattern to be formed in a second pattern forming region different from the first pattern forming region, to a substrate by guiding an illumination light passing through the fir...

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Bibliographische Detailangaben

1. Verfasser:	NISHINAGA HISASHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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