LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic apparatus and device manufacturing method is provided to prevent the degradation of the performance of the apparatus by limiting the movement of the immersion solution and reducing the amount of the immersion solution deviated from the dipping system. In a lithographic apparatus and d...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	BECKERS MARCEL, BRUIJSTENS JEROEN PETER JOHANNES, THOMAS IVO ADAM JOHANNES, VAN DE KERKHOF MARCUS ADRIANUS, JANSSEN FRANCISCUS JOHANNES JOSEPH, VAN OERLE BARTHOLOMEUS MATHIAS, MAAS WOUTERUS JOHANNES PETRUS MARIA, LANDHEER SIEBE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A lithographic apparatus and device manufacturing method is provided to prevent the degradation of the performance of the apparatus by limiting the movement of the immersion solution and reducing the amount of the immersion solution deviated from the dipping system. In a lithographic apparatus and device manufacturing method, a lithography apparatus comprises the projection system(PL) for projecting the radiating beam on the target area of substrate and it includes a barrier member(10) surrounding the space between the projection system and substrate. The storage for the liquid is formed by a part and projection system of the barrier member. The outer surface of the radial direction of a portion of the projection system which is in opposite directions and the outer surface of the radial direction of the barrier member which is in opposite directions in a portion of the projection system have the(liquidphobic outer surface).