LIGHT EXPOSURE DEVICE
An exposure apparatus is provided to prevent a mask from running against a substrate and being damaged due to a wrong operation or an operator's mistake by forming a mask protecting unit at a mask stage. An exposure apparatus(101) comprises a substrate stage(102), a horizontally shifting unit(1...
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| creator | JEON, YEONG HA |
| description | An exposure apparatus is provided to prevent a mask from running against a substrate and being damaged due to a wrong operation or an operator's mistake by forming a mask protecting unit at a mask stage. An exposure apparatus(101) comprises a substrate stage(102), a horizontally shifting unit(103), a vertically shifting unit(104), a mask stage(105), a mask protection unit(106), and a light source(107). A substrate(112) is mounted at the substrate stage. The horizontally shifting unit, formed at the substrate stage, horizontally shifts the substrate. The vertically shifting unit, formed at the substrate stage, shifts the substrate up and down. A mask(115) is mounted at the mask stage. The mask protection unit is formed at the mask stage in order to prevent the mask settled at the mask stage, from coming into contact with the substrate settled at the substrate stage. The light source, located on the upper part of the mask stage, supplies light to the substrate. |
| format | Patent |
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An exposure apparatus(101) comprises a substrate stage(102), a horizontally shifting unit(103), a vertically shifting unit(104), a mask stage(105), a mask protection unit(106), and a light source(107). A substrate(112) is mounted at the substrate stage. The horizontally shifting unit, formed at the substrate stage, horizontally shifts the substrate. The vertically shifting unit, formed at the substrate stage, shifts the substrate up and down. A mask(115) is mounted at the mask stage. The mask protection unit is formed at the mask stage in order to prevent the mask settled at the mask stage, from coming into contact with the substrate settled at the substrate stage. The light source, located on the upper part of the mask stage, supplies light to the substrate.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; MATERIALS THEREFOR ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080827&DB=EPODOC&CC=KR&NR=20080078225A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080827&DB=EPODOC&CC=KR&NR=20080078225A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JEON, YEONG HA</creatorcontrib><title>LIGHT EXPOSURE DEVICE</title><description>An exposure apparatus is provided to prevent a mask from running against a substrate and being damaged due to a wrong operation or an operator's mistake by forming a mask protecting unit at a mask stage. An exposure apparatus(101) comprises a substrate stage(102), a horizontally shifting unit(103), a vertically shifting unit(104), a mask stage(105), a mask protection unit(106), and a light source(107). A substrate(112) is mounted at the substrate stage. The horizontally shifting unit, formed at the substrate stage, horizontally shifts the substrate. The vertically shifting unit, formed at the substrate stage, shifts the substrate up and down. A mask(115) is mounted at the mask stage. The mask protection unit is formed at the mask stage in order to prevent the mask settled at the mask stage, from coming into contact with the substrate settled at the substrate stage. The light source, located on the upper part of the mask stage, supplies light to the substrate.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBD18XT3CFFwjQjwDw4NclVwcQ3zdHblYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBgYWBgbmFkZGpo7GxKkCABHRH78</recordid><startdate>20080827</startdate><enddate>20080827</enddate><creator>JEON, YEONG HA</creator><scope>EVB</scope></search><sort><creationdate>20080827</creationdate><title>LIGHT EXPOSURE DEVICE</title><author>JEON, YEONG HA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20080078225A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>JEON, YEONG HA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JEON, YEONG HA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LIGHT EXPOSURE DEVICE</title><date>2008-08-27</date><risdate>2008</risdate><abstract>An exposure apparatus is provided to prevent a mask from running against a substrate and being damaged due to a wrong operation or an operator's mistake by forming a mask protecting unit at a mask stage. An exposure apparatus(101) comprises a substrate stage(102), a horizontally shifting unit(103), a vertically shifting unit(104), a mask stage(105), a mask protection unit(106), and a light source(107). A substrate(112) is mounted at the substrate stage. The horizontally shifting unit, formed at the substrate stage, horizontally shifts the substrate. The vertically shifting unit, formed at the substrate stage, shifts the substrate up and down. A mask(115) is mounted at the mask stage. The mask protection unit is formed at the mask stage in order to prevent the mask settled at the mask stage, from coming into contact with the substrate settled at the substrate stage. The light source, located on the upper part of the mask stage, supplies light to the substrate.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | LIGHT EXPOSURE DEVICE |
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