BLACK MATRIX COMPOSITION AND METHODS OF FORMING THE SAME
A black matrix composition, a coated substrate using the composition, and a method for forming a color filter for a flat panel display by using the composition are provided to improve the precision of spraying of an ink, thereby enhancing the quality of a color filter prepared by an ink-jet printing...
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| creator | ZHOU LIGUI SHANG QUANYUAN |
| description | A black matrix composition, a coated substrate using the composition, and a method for forming a color filter for a flat panel display by using the composition are provided to improve the precision of spraying of an ink, thereby enhancing the quality of a color filter prepared by an ink-jet printing method of high treatment amount. A black matrix composition comprises an additive comprising polymerizable molecules, wherein the each polymerizable molecule comprises a polar moiety and an apolar moiety, and the apolar moiety has no affinity to an ink. Preferably the apolar moiety of the polymerizable molecules moves toward the surface of the composition. Preferably the additive comprises at least one selected from a fluorinated acrylate monomer, a fluorinated acrylate oligomer, a silicone group-containing acrylate monomer, a silicone group-containing acrylate oligomer, a hydrophobic group-containing acrylate monomer, a hydrophobic group-containing acrylate oligomer, a reactive wax, and a fluorosilane. |
| format | Patent |
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A black matrix composition comprises an additive comprising polymerizable molecules, wherein the each polymerizable molecule comprises a polar moiety and an apolar moiety, and the apolar moiety has no affinity to an ink. Preferably the apolar moiety of the polymerizable molecules moves toward the surface of the composition. Preferably the additive comprises at least one selected from a fluorinated acrylate monomer, a fluorinated acrylate oligomer, a silicone group-containing acrylate monomer, a silicone group-containing acrylate oligomer, a hydrophobic group-containing acrylate monomer, a hydrophobic group-containing acrylate oligomer, a reactive wax, and a fluorosilane.</description><language>eng</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HOLOGRAPHY ; INKS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080131&DB=EPODOC&CC=KR&NR=20080011054A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080131&DB=EPODOC&CC=KR&NR=20080011054A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHOU LIGUI</creatorcontrib><creatorcontrib>SHANG QUANYUAN</creatorcontrib><title>BLACK MATRIX COMPOSITION AND METHODS OF FORMING THE SAME</title><description>A black matrix composition, a coated substrate using the composition, and a method for forming a color filter for a flat panel display by using the composition are provided to improve the precision of spraying of an ink, thereby enhancing the quality of a color filter prepared by an ink-jet printing method of high treatment amount. A black matrix composition comprises an additive comprising polymerizable molecules, wherein the each polymerizable molecule comprises a polar moiety and an apolar moiety, and the apolar moiety has no affinity to an ink. Preferably the apolar moiety of the polymerizable molecules moves toward the surface of the composition. Preferably the additive comprises at least one selected from a fluorinated acrylate monomer, a fluorinated acrylate oligomer, a silicone group-containing acrylate monomer, a silicone group-containing acrylate oligomer, a hydrophobic group-containing acrylate monomer, a hydrophobic group-containing acrylate oligomer, a reactive wax, and a fluorosilane.</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBw8nF09lbwdQwJ8oxQcPb3DfAP9gzx9PdTcPRzUfB1DfHwdwlW8HdTcPMP8vX0c1cI8XBVCHb0deVhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGBhYGBoaGBqYmjsbEqQIA6OcpAA</recordid><startdate>20080131</startdate><enddate>20080131</enddate><creator>ZHOU LIGUI</creator><creator>SHANG QUANYUAN</creator><scope>EVB</scope></search><sort><creationdate>20080131</creationdate><title>BLACK MATRIX COMPOSITION AND METHODS OF FORMING THE SAME</title><author>ZHOU LIGUI ; SHANG QUANYUAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20080011054A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHOU LIGUI</creatorcontrib><creatorcontrib>SHANG QUANYUAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHOU LIGUI</au><au>SHANG QUANYUAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>BLACK MATRIX COMPOSITION AND METHODS OF FORMING THE SAME</title><date>2008-01-31</date><risdate>2008</risdate><abstract>A black matrix composition, a coated substrate using the composition, and a method for forming a color filter for a flat panel display by using the composition are provided to improve the precision of spraying of an ink, thereby enhancing the quality of a color filter prepared by an ink-jet printing method of high treatment amount. A black matrix composition comprises an additive comprising polymerizable molecules, wherein the each polymerizable molecule comprises a polar moiety and an apolar moiety, and the apolar moiety has no affinity to an ink. Preferably the apolar moiety of the polymerizable molecules moves toward the surface of the composition. Preferably the additive comprises at least one selected from a fluorinated acrylate monomer, a fluorinated acrylate oligomer, a silicone group-containing acrylate monomer, a silicone group-containing acrylate oligomer, a hydrophobic group-containing acrylate monomer, a hydrophobic group-containing acrylate oligomer, a reactive wax, and a fluorosilane.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES USE OF MATERIALS THEREFOR WOODSTAINS |
| title | BLACK MATRIX COMPOSITION AND METHODS OF FORMING THE SAME |
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